Touch display panel and manufacturing method thereof

This application claims the priority benefit of Taiwan application serial no. 102120359, filed on Jun. 7, 2013. The entirety of the above-mentioned patent application is hereby incorporated by reference herein and made a part of this specification.

The invention relates to a touch display panel and a manufacturing method thereof, and more particularly to an in-cell type touch display panel and a manufacturing method thereof.

Touch panels can substantially be divided into added-on types, on-cell types and in-cell types according to an arrangement relationship between a touch panel and a display panel. Typically, the added-on type touch panels are formed by manufacturing a touch device on a substrate to form a touch panel, and then attaching the touch panel on an outer surface of a display panel. The on-cell type touch panel has a touch device being integrated onto a display panel. The in-cell type touch panel, on the other hand, has a touch device being directly integrated into a display panel. In comparison with the added-on type touch panels, the on-cell type touch panels and the in-cell type touch panel are perfectly beneficial for accomplishing thinness and lightness of displays.

Nevertheless, regardless of the added-on type, on-cell type or in-cell type touch panel, several photo-mask processes have to be further applied to a contemporary structure of the display panel to complete a design of a touch sensing layer of a touch panel so as to form a touch display panel. Therefore, at present, it requires many photo-mask manufacturing processes to complete a manufacture of the touch display panel.

The invention provides an active device array substrate having a touch sensing layer so as to provide a driving function and a touch sensing function at the same time.

The invention provides a manufacturing method of an active device array substrate, in which a manufacture of a touch sensing layer is integrated in a manufacturing process of a contemporary active device array layer.

The invention provides a touch display panel, which includes the aforesaid active device array substrate.

The invention provides an active device array substrate, which includes a substrate, a pixel array and a touch sensing layer. The pixel array is disposed on the substrate. The touch sensing layer includes a plurality of first sensing pads disposed on the pixel array and a plurality of bridge conductors embedded in the pixel array. The first sensing pads and the bridge conductors are electrically connected so as to form a plurality of first sensing series.

The invention further provides a manufacturing method of an active device array substrate, which includes the following steps. First, a pixel array and a plurality of bridge conductors are formed on the substrate, wherein the bridge conductors are embedded in the pixel array. Next, a plurality of first sensing pads are formed on the pixel array, wherein the first sensing pads and the bridge conductors are electrically connected to form a plurality of first sensing series.

The invention further provides a touch display panel, which includes the aforesaid active device array substrate, a display medium and an opposite substrate, wherein the display medium is disposed between the active device array substrate and the opposite substrate.

In an embodiment of the invention, the touch display panel further includes a shielding conductive layer. The shielding conductive layer is disposed on the touch sensing layer, and is in direct contact with the touch sensing layer.

In an embodiment of the invention, the touch display panel further includes a shielding conductive layer. The shielding conductive layer overlaps with data lines and scan lines.

In light of the above, the invention integrates the manufacture of the touch sensing layer into the manufacturing process of the pixel array, so as to manufacture the active device array substrate having both touch sensing function and driving function at the same time through fewer photo-mask manufacturing processes. Accordingly, the manufacture of the touch sensing layer can be completed without further increasing numbers of photo-masks, and manufacturing costs of the touch display panel can be lowered.

To make the aforesaid features and advantages of the invention more comprehensible, several embodiments accompanied with drawings are described in details as follows.

FIGS. 1A to 1G are schematic views illustrating a flowing process of manufacturing an active device array substrate according to an embodiment of the invention.

FIG. 2 is a schematic cross-sectional view along lines A-A′ and B-B′ depicted in FIG. 1G .

FIG. 3 is a top view of the first sensing series and the second sensing series depicted in FIG. 1G .

FIG. 4 is a top view of the first sensing series and the second sensing series according to another embodiment of the invention.

FIG. 5 is a top view of the first sensing series and the second sensing series according to another embodiment of the invention.

FIG. 6 is a schematic cross-sectional view of a touch display panel according to an embodiment of the invention.

FIGS. 1A to 1G are schematic views illustrating a flowing process of manufacturing an active device array substrate according to an embodiment of the invention, wherein FIGS. 1A to 1G are top views. First, referring to FIG. 1A , a first conductive layer C 1 is formed on a substrate 102 . The first conductive layer C 1 includes a plurality of scan lines SL, a plurality of gates G and a plurality of bridge conductors B 1 . Each of the scan lines SL extends along a first direction D 1 . An extending direction of the bridge conductor B 1 is substantially the same as the extending direction of the scan lines SL. Thus, each of the bridge conductors B 1 substantially extends along the first direction D 1 . A material of the first conductive layer C 1 is, for example, a metal, a transparent conductive material, any other suitable conductive material or stacked layers of the aforesaid materials.

Next, referring to FIG. 1B , a first patterned insulating layer 110 is formed on the substrate 102 . The first patterned insulating layer 110 covers the substrate 102 and the first conductive layer C 1 . The first patterned insulating layer 110 has a plurality of first openings H 1 , and the first openings H 1 expose the bridge conductors B 1 . A material of the first patterned insulating layer 110 is, for example, silicon nitride, silicon oxide or any other suitable insulating material.

Thereafter, referring to FIG. 1C , a plurality of channel layers CH are formed on the first patterned insulating layer 110 . The channel layers CH are, for example, semiconductor material layers. The channel layers CH cover the gates G.

Subsequently, referring to FIG. 1D , a plurality of pixel electrodes PE are formed on the first patterned insulating layer 110 , wherein a part of the pixel electrodes PE have a second opening H 2 . The second opening H 2 exposes the first opening H 1 and exposes the first patterned insulating layer 110 at a periphery of the first opening H 1 , and a boundary of the second opening H 2 must be larger than a boundary of the first opening H 1 . Arrangements of the second openings H 2 in the pixel electrodes PE can be determined based on design demands. A material of the pixel electrode is, for example, a transparent metal oxide, any other suitable transparent conductive material or any other suitable conductive material.

Next, referring to FIG. 1E , a second conductive layer C 2 is formed. The second conductive layer C 2 includes a source S, a drain D and a plurality of data lines DL. The source S is electrically connected to the data line DL. The drain D covers a part of the pixel electrode PE, and is electrically connected to the pixel electrode PE. The gate G, the channel layer CH, the source S and the drain D substantially constitute an active device T. The active device T is electrically connected to the scan line SL and the data line DL, and the active device T is electrically connected to the pixel electrode PE to form a sub-pixel unit P. Each of the data lines DL extends along a second direction D 2 . The scan lines SL and the data lines DL are intersected to define a plurality of pixel areas U. The scan lines SL and the data lines DL are not disposed in parallel. In other embodiments, the scan lines SL and the data lines DL may be disposed perpendicularly. One sub-pixel unit P is, for example, correspondingly disposed in each of the pixel areas U. A material of the second conductive layer C 2 is, for example, the same as the material of the first conductive layer C 1 . In consideration of electrical conductivity, the materials of the first conductive layer C 1 and the second conductive layer C 2 are, preferably, metal materials.

Next, referring to FIG. 1F , a second patterned insulating layer 120 is formed. The second patterned insulating layer 120 covers the first patterned insulating layer 110 , the pixel electrodes PE and the second conductive layers C 2 . The second patterned insulating layer 120 has a plurality of third openings H 3 . A boundary of the third opening H 3 is, for example, located between the boundary of the first opening H 1 and the boundary of the second opening H 2 . The second patterned insulating layer 120 is partially filled in the second opening H 2 to cover a sidewall of the pixel electrode PE located at a periphery of the second opening H 2 . In other words, the third opening H 3 of the second patterned insulating layer 120 exposes the bridge conductor B 1 and a part of the first patterned insulating layer 110 . In other embodiments, the boundary of the third opening H 3 can also be aligned to the boundary of the first opening H 1 , such that the third opening H 3 only exposes the bridge conductor B 1 . A material of the second patterned insulating layer 120 is, for example, silicon nitride, silicon oxide or any other suitable insulating material. Then, a pixel array 100 and the plurality of the bridge conductors B 1 are manufactured completely, wherein the pixel array 100 substantially consists of the scan lines SL, the data lines DL and the sub-pixel units P.

Next, referring to FIG. 1G , a touch sensing layer 130 is formed on the pixel array 100 . The touch sensing layer 130 includes a plurality of first sensing pads P 1 and a plurality of second sensing series S 2 . The first sensing pads P 1 are disposed in the sub-pixel units P having the first openings H 1 , the second openings H 2 and the third openings H 3 . Further, the sensing pads P 1 are filled in the first openings H 1 , the second openings H 2 and the third openings H 3 , and are electrically connected to the bridge conductors B 1 to form a plurality of first sensing series S 1 . In other words, the first sensing series S 1 is, for example, formed by serially connecting the first sensing pad P 1 disposed on the pixel array 100 and the bridge conductor B 1 embedded in the pixel array 100 . The first sensing series S 1 and the second sensing series S 1 are intersected and electrically insulated from each other. A material of the touch sensing layer 130 is, for example, a transparent metal oxide, any other suitable transparent conductive material or any other suitable conductive material. Notably, other than being used for a touch sensing function, the first sensing pads P 1 and the second sensing series S 2 disposed on the pixel array 100 can further be used as common electrodes E, which can couple with the pixel electrodes PE to form storage capacitors. Accordingly, an active device array substrate 10 of the present embodiment can finish manufacturing the first sensing series S 1 and the second sensing series S 2 when manufacturing the pixel array 100 and the common electrodes E at the same time. In other words, the present embodiment can manufacture the active device array substrate 10 having both a driving function and a touch sensing function simultaneously with fewer photo-mask manufacturing processes.

FIG. 2 is a schematic cross-sectional view along Lines A-A′ and B-B′ depicted in FIG. 1G . FIG. 3 is a top view of a first sensing series S 1 and a second sensing series S 2 depicted in FIG. 1G . Referring to FIG. 1G , FIG. 2 and FIG. 3 . The touch sensing layer 130 of the present embodiment includes the first sensing pads P 1 of the first sensing series S 1 and the second sensing series S 2 . The first sensing series S 1 extends along the first direction D 1 The second sensing series S 2 extends along the second direction D 2 . The first sensing pad P 1 is disposed on the second patterned insulating layer 120 of the pixel array 100 . The bridge conductors B 1 are disposed on the substrate 102 , and each of the bridge conductors B 1 extends, for example, along the first direction D 1 and crosses over a second sensing pad P 2 of one of the second sensing series S 2 .

Specifically, the sub-pixel units P including the first sensing pads P 1 have openings (such as the first opening H 1 , the second opening H 2 and the third opening H 3 ), such that the first sensing pad P 1 is connected to the bridge conductor B 1 disposed on the substrate 102 through the openings. On the contrary, the sub-pixel units P including the second sensing pads P 2 do not have the openings. Thus, the second sensing pad P 2 is not connected to the bridge conductor B 1 . Accordingly, the first sensing series S 1 and the second sensing series S 2 are electrically insulated from each other. It should noted that the second patterned insulating layer 120 covers the pixel electrode PE located at the second opening H 2 . Therefore, a short circuit phenomenon caused by a contact to the pixel electrode PE from the first sensing pad P 1 can be avoided when the first sensing pad P 1 is filled in the openings (H 1 , H 2 and H 3 ).

In the present embodiment, an area occupied by each of the first sensing pads P 1 or each of the second sensing pads P 2 substantially corresponds to approximately three pixel areas U. Specifically, the first sensing pad P 1 is, for example, formed by connecting three common electrodes E in three adjacent sub-pixel units P, wherein the two adjacent common electrodes E are connected by a connecting portion C. Nevertheless, the invention is not limited thereto. In other embodiments, the first sensing pad P 1 can be formed by one common electrode E, or the first sensing pad P 1 can also be formed by two or more than three common electrodes E connecting to each other. Similarly, the second sensing pad P 2 can be formed by one common electrode E, or the second sensing pad P 2 can also be formed by two or more than three common electrodes E connecting to each other. Moreover, in the present embodiment, the common electrodes E are disposed on the pixel array 100 . Consequently, a pixel aperture ratio is high and a storage capacitance is large. As a result, a flickering phenomenon is reduced on display images of a touch display panel 1 .

In the embodiment of FIG. 3 , the bridge conductor B 1 is, for example, disposed only below where the opening will be formed and below the second sensing series S 2 over which the bridge conductor B 1 will cross. In other words, the plurality of bridge conductors B 1 are disposed in the same first sensing series S 1 to connect each of the first sensing pads P 1 . Nevertheless, the invention is not limited thereto. FIG. 4 is a top view of the first sensing series S 1 and the second sensing series S 2 according to another embodiment of the invention. Referring to FIG. 1G and FIG. 4 . In consideration of simplifying a design of a photo-mask pattern, the bridge conductors B 1 can also be designed to be disposed below all of the first sensing pads P 1 of the same first sensing series S 1 and below the second sensing series S 2 over which the bridge conductors B 1 cross. In other words, only one strip bridge conductor B 1 is disposed in the same first sensing series S 1 .

FIG. 5 is a top view of the first sensing series S 1 and the second sensing series S 2 according to another embodiment of the invention. Referring to FIG. 1G and FIG. 5 . In the present embodiment, a shielding conductive layer 140 can also be formed on the first sensing pad P 1 and the second sensing series S 2 . The shielding conductive layer 140 is in direct contact with the first sensing pad P 1 and the second sensing series S 2 . Thus, the conductive resistances of the first sensing pad P 1 and the second sensing series S 2 can be lowered. In the present embodiment, the shielding conductive layer 140 is, for example, disposed by selectively corresponding to the data lines DL and the scan lines SL. Specifically speaking, the shielding conductive layer 140 may overlap with the data lines DL and the scan lines SL, and the shielding conductive layer 140 may completely cover the data lines DL and the scan lines SL to shield the data lines DL and the scan lines SL, so as to prevent users from observing the data lines DL and the scan lines SL. Accordingly, when the active device array substrate set in the present embodiment is used for manufacturing a touch display panel, a black matrix is not needed to be disposed on an opposite substrate. Further, in a premise that disposing a black matrix is no longer needed, a process for manufacturing a planar layer prior to manufacturing the black matrix can be eliminated. Therefore, steps for manufacturing a touch display panel can further be simplified.

In the aforesaid embodiment, the bridge conductors B 1 and the scan lines SL are manufactured together, and the extending direction of the bridge conductors B 1 is substantially parallel to the extending direction of the scan lines SL. Nevertheless, the invention is not limited thereto. As long as the first sensing pad P 1 in the first sensing series S 1 is disposed on the pixel array 100 and the bridge conductor B 1 is embedded in the pixel array 100 , such arrangement is the spirit which the invention seeks to protect. For instance, the bridge conductors B 1 can also be manufactured together with the data lines DL or be manufactured together with the pixel electrodes PE.

FIG. 6 is a schematic cross-sectional view of a touch display panel according to an embodiment of the invention. A touch display panel 1 includes an active device array substrate 10 , a display medium 20 and an opposite substrate 30 , wherein the display medium 20 is disposed between the active device array substrate 10 and the opposite substrate 30 . The display medium 20 contains, for example, a liquid crystal display material, an electro-phoretic display material, an electrowetting display material or any other suitable display material. It should be noted that the aforesaid varieties of the display medium 20 is only exemplary, and the invention does not limit varieties of the display medium 20 .

In summary, the first sensing series of the invention is formed by connecting the bridge conductors to two adjacent first sensing pads, and the bridge conductors are embedded in the pixel array and crossing over the second sensing series. A manufacture of the bridge conductors can be integrated into a manufacturing process of the pixel array, as so to manufacture the active device array substrate having both a touch sensing function and a driving function at the same time with fewer photo-mask manufacturing processes.

Accordingly, a manufacturing process of the touch display panel can be simplified with fewer steps, and costs for manufacturing the touch display panel can be effectively lowered.