Exposure apparatus having blind and method of driving

This application claims priority from and the benefit of Korean Patent Application No. 10-2011-0050672, filed on May 27, 2011, which is incorporated by reference for all purposes as if fully set forth herein.

1. Field

Exemplary embodiments of the present invention relate to an exposure apparatus having a blind and a method of driving the exposure apparatus. More particularly, exemplary embodiments of the present invention relate to an exposure apparatus having a blind capable of removing a stain on a substrate to improve display quality and a method of driving the exposure apparatus.

2. Discussion of the Background

Generally, a liquid crystal display (LCD) apparatus includes an LCD panel including a thin film transistor (TFT) substrate, a color filter substrate opposite to the TFT substrate and a liquid crystal layer disposed between the TFT substrate and the color filter substrate.

The TFT substrate and the color filter substrate generally have a multi-layered structure formed by a photo step, an exposure step, and an etching step.

In the exposure step, light is irradiated on a substrate, on which a photoresist layer is coated, through a photo mask having a specific pattern. The photoresist layer is reacted with the light to form the pattern according to the pattern formed on the photo mask.

To decrease a cost for manufacturing the liquid crystal display apparatus, a size of a mother substrate increases so that more liquid crystal display panels are formed in one manufacturing process. However, according to an increase of the size of the mother substrate, a size of the photo mask may be also increased so that the cost for manufacturing the liquid crystal display apparatus may be increased.

Recently, a small mask type exposure process is employed in order to decrease the size of the photo mask, in a conventional photolithography method. In the small mask type exposure process, the substrate is exposed using a plurality of exposures and a plurality of small photo masks which are moving.

The substrate has an exposed area and a non-exposed area. The exposure includes a blind blocking an exposure window of the photo mask to prevent the non-exposed area from being exposed. The blind is moved from a first side of the exposure window to a second side of the exposure window to block a first non-exposed area. The blind should be returned from the second side of the exposure window to the first side of the exposure window after blocking the first non-exposed area to be ready to cover a second non-exposed area.

However, when the blind is returned, the blind passes through an exposure window area so that the light may be partially blocked by the blind. Accordingly, a stain may appear in the exposed area due to different amounts of exposure.

When the stain is relatively serious, the display quality of the liquid crystal display panel may be deteriorated. Even when the stain is not relatively serious, the stain may be a noise for detecting other display errors. Thus, the display quality may be deteriorated.

Exemplary embodiments of the present invention provide an exposure apparatus including a blocking plate including an opening portion to prevent the stain on a substrate due to the blocking plate.

Exemplary embodiments of the present invention also provide a method of driving the exposure apparatus.

Additional features of the invention will be set forth in the description which follows, and in part will be apparent from the description, or may be learned by practice of the invention.

An exemplary embodiment of the present invention discloses an exposure apparatus, including: a light source to emit light in a light emitting cycle; a mask disposed on a substrate comprising an exposure window, a pattern being formed therein; a blind comprising a plurality of blocking plates, each blocking plate comprising a blocking portion and an opening portion, the blind disposed over the exposure window to move in a first direction to block a non-exposed area on the substrate and to pass through the exposure window area in a second direction opposite to the first direction; and a blind driver to drive the blind.

An exemplary embodiment of the present invention also discloses a method of driving an exposure apparatus, the method including: emitting light from a light source in a light emitting cycle; moving a plurality of blocking plates in a first direction to block light from reaching a non-exposed area of a substrate, wherein the blocking plates are disposed over the substrate and an exposure window of a mask, and the blocking plates comprise a blocking portion and an opening portion; and moving the blocking plates to pass through the exposure window area of the mask in a second direction opposite to the first direction.

It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory and are intended to provide further explanation of the invention as claimed. Other features and aspects will be apparent from the following detailed description, the drawings, and the claims.

The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention, and together with the description serve to explain the principles of the invention.

FIG. 1 is a plan view of an exposure apparatus according to an exemplary embodiment of the present invention.

FIG. 2 is a diagram of an exposure part of the exposure apparatus of FIG. 1 .

FIG. 3 is a block diagram of a portion of the exposure part of FIG. 2 .

FIG. 4 is a plan view of a blind of FIG. 2 .

FIG. 5 is a plan view of a blocking plate of FIG. 2 .

FIG. 6 is a cross-sectional view of the blocking plate of FIG. 2 .

FIG. 7 is a cross-sectional view of the blocking plate of FIG. 2 and a gray region formed by the blocking plate.

FIG. 8 is an enlarged cross-sectional view of a portion A of FIG. 7 .

FIG. 9 is a cross-sectional view of a blocking plate and a gray region according to an exemplary embodiment of the present invention.

FIG. 10 is a plan view of a blocking plate according to an exemplary embodiment of the present invention.

FIG. 11 is a cross-sectional view of the blocking plate of FIG. 10 .

FIG. 12 is a cross-sectional view of the blocking plate of FIG. 10 according to an exemplary embodiment of the present invention.

FIG. 13 is an enlarged cross-sectional view of a portion B of FIG. 12 .

FIG. 14 is a cross-sectional view of a blocking plate and a gray region according to an exemplary embodiment of the present invention.

FIG. 15 is a plan view of a blocking plate according to an exemplary embodiment of the present invention.

FIG. 16 is a plan view of a blocking plate according to an exemplary embodiment of the present invention.

The invention is described more fully hereinafter with reference to the accompanying drawings, in which embodiments of the invention are shown. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure is thorough, and will fully convey the scope of the invention to those skilled in the art. In the drawings, the size and relative sizes of layers and regions may be exaggerated for clarity. Like reference numerals in the drawings denote like elements.

It will be understood that when an element or layer is referred to as being “on” or “connected to” another element or layer, it can be directly on or directly connected to the other element or layer, or intervening elements or layers may be present. In contrast, when an element is referred to as being “directly on” or “directly connected to” another element or layer, there are no intervening elements or layers present.

FIG. 1 is a plan view of an exposure apparatus according to an exemplary embodiment of the present invention.

Referring to FIG. 1 , an exposure apparatus 1000 includes a loading part 100 , a stage 300 , an exposure part 500 , and an unloading part 700 .

The loading part 100 loads a substrate 2000 from outside of the exposure apparatus 1000 , and the substrate 2000 is exposed by the exposure apparatus 1000 .

The stage 300 transfers the substrate 2000 from the loading part 100 to the exposure part 500 along a first direction D 1 , and transfers the substrate 2000 from the exposure part 500 to the unloading part 700 . The stage 300 extends along the first direction D 1 .

The substrate 2000 may be exposed by a scan type or a step type. In the scan type exposing, the stage 300 may continuously transfer the substrate 2000 . In the step type exposing, the stage 300 may discontinuously transfer the substrate 2000 with a repetition of movements and stops. The scan type exposing may be applied to form a strip pattern on the substrate 2000 . The step type exposing may be applied to form an island pattern on the substrate 2000 .

The stage 300 may use a magnetic levitation method to transfer the substrate 2000 .

The exposure part 500 irradiates the light to the substrate 2000 , which is transferred from the stage 300 , to form a pattern on the substrate 2000 . The fixed exposure part 500 exposes the substrate 2000 moving in the first direction D 1 so that the pattern on the substrate 2000 may have a direction opposite to the first direction D 1 .

The exposure part 500 may include a plurality of exposure modules. The exposure modules are disposed in a plurality of columns. For example, the exposure modules are disposed in two columns. The exposure modules in a first column are alternately disposed with the exposure modules in a second column so that the substrate 2000 may be entirely exposed by the exposure modules. As shown in FIG. 1 , five exposure modules may be disposed in the first column, and four exposure modules may be disposed in the second column.

A structure and an operation of the exposure part 500 are explained below in detail.

The unloading part 700 unloads the substrate 2000 , on which the pattern is formed, to outside of the exposure apparatus 1000 .

The substrate 2000 may be a thin film transistor (TFT) substrate or a color filter substrate, which are essential elements of a liquid crystal display (LCD) panel of an LCD apparatus displaying an image. The TFT substrate may include TFTs disposed in a matrix pattern on a glass substrate as a switching element. The color filter substrate may include red, green, and blue pixels.

FIG. 2 is a diagram of the exposure part of the exposure apparatus of FIG. 1 . FIG. 3 is a block diagram illustrating a portion of an exposure part of FIG. 2 . FIG. 4 is a plan view of a blind 530 of FIG. 2 .

Referring to FIG. 2 , FIG. 3 , and FIG. 4 , the exposure part 500 includes a light source 510 , a blind 530 , a blind driver 550 , a mask 570 , and an image processor 590 . The exposure part 500 may include a plurality of exposure modules. Each of the exposure modules may include the light source 510 , the blind 530 , the blind driver 550 , the mask 570 , and the image processor 590 .

The light source 510 is disposed over the blind 530 and the mask 570 to irradiate the light toward the mask 570 . The light may be irradiated substantially perpendicular to a plane of the mask 570 .

The light source 510 includes a light source driver 511 , a lamp 513 , and a laser oscillator 515 . The lamp 513 may include a mercury lamp. The laser oscillator 515 may include an Nd-YAG laser oscillator. The light source 510 may include a light concentrating part (not shown) which concentrates the light from the laser oscillator 515 . The light concentrating part may include at least one reflective lens.

The light source driver 511 outputs a master trigger signal M_TR and a laser oscillation start signal Q_TR to the lamp 513 .

The lamp 513 emits the light in response to the master trigger signal M_TR. The lamp 513 stops emitting the light in response to the laser oscillation start signal Q_TR.

The laser oscillator 515 oscillates a laser beam based on the light from the lamp 513 in response to the laser oscillation start signal Q_TR.

The light source 510 emits the light in a predetermined cycle. For example, when a frequency of the light source 510 is about 50 Hz, the light emitting cycle may be about 20 msec. The laser oscillation period may be very short in the light emitting cycle. Thus, a non-oscillation period of the laser may be substantially 20 msec.

The blind 530 is disposed over the exposure window 571 of the mask 570 so that the blind 530 blocks the light irradiated from the light source 510 from passing through the mask 570 . The blind 530 is used to block a non-exposed area of the substrate 2000 .

The blind 530 includes a plurality of blocking plates. For example, the blind 530 may include six blocking plates: blocking plate P 1 , blocking plate P 2 , blocking plate P 3 , blocking plate P 4 , blocking plate P 5 , and blocking plate P 6 .

The blind 530 extends in the first direction D 1 , and the blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 may be moved within moving area A 1 and moving area A 2 .

The blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 may be disposed in different planes from each other and may move individually. The blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 may be formed to overlap with each other in a plan view. The blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 may be disposed in the first direction D 1 , and extend in a direction substantially perpendicular to the first direction D 1 . Each of the blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 may have a rectangular parallelepiped shape. The blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 may include a carbon fiber material.

Each of blocking plate P 1 , blocking plate P 2 , blocking plate P 3 , blocking plate P 4 , blocking plate P 5 , and blocking plate P 6 includes a blocking portion and an opening portion. The blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate may overlap with each other so that the opening portion of a blocking plate is blocked by another blocking plate.

A first blocking plate group includes a first blocking plate P 1 and a second blocking plate P 2 . The first blocking plate P 1 and the second blocking plate P 2 overlap with each other so that a blocking portion of the first blocking plate P 1 may cover an opening portion of the second blocking plate P 2 and a blocking portion of the second blocking plate P 2 may cover an opening portion of the first blocking plate P 1 . Thus, the first blocking plate P 1 and the second blocking plate P 2 in the first blocking plate group may function as a blind blocking a non-exposed area of the substrate 2000 .

In a similar way, a second blocking plate group includes a third blocking plate P 3 and a fourth blocking plate P 4 . The third blocking plate P 3 and fourth blocking plate P 4 overlap with each other so that a blocking portion of the third blocking plate P 3 may cover an opening portion of the fourth blocking plate P 4 and a blocking portion of the fourth blocking plate P 4 may cover an opening portion of the third blocking plate P 3 .

In a similar way, a third blocking plate group includes a fifth blocking plate P 5 and a sixth blocking plate P 6 . The fifth blocking plate P 5 and the sixth blocking plate P 6 overlap with each other so that a blocking portion of the fifth blocking plate P 5 may cover an opening portion of the sixth blocking plate P 6 and a blocking portion of the sixth blocking plate P 6 may cover an opening portion of the fifth blocking plate P 5 .

The first blocking plate P 1 may have a width substantially the same as the second blocking plate P 2 in the first direction D 1 . The third blocking plate P 3 may have a width substantially the same as the fourth blocking plate P 4 in the first direction D 1 . The fifth blocking plate P 5 may have a width substantially the same as the sixth blocking plate P 6 in the first direction D 1 .

The first blocking plate P 1 and the second blocking plate P 2 in the first blocking plate group may have widths different from the third blocking plate P 3 and the fourth blocking plate P 4 in the second blocking plate group. In addition, the third blocking plate P 3 and the fourth blocking plate P 4 in the second blocking plate group may have widths different from the fifth blocking plate P 5 and the sixth blocking plate P 6 in the third blocking plate group. Accordingly, the first blocking plate P 1 , the third blocking plate P 3 , and the fifth blocking plate P 5 may be selectively used according to a width of the non-exposed area.

Although the blind 530 is depicted to include blocking plate P 1 , blocking plate P 2 , blocking plate P 3 , blocking plate P 4 , blocking plate P 5 , and blocking plate P 6 in FIG. 2 , FIG. 3 , and FIG. 4 , the present invention is not limited thereto. In addition, although each blocking group is described to include two blocking plates overlapped with each other in FIG. 2 , FIG. 3 , and FIG. 4 , the present invention is not limited thereto.

The blind driver 550 includes a motor control unit 551 and a plurality of motors, collectively motors 553 . The motor control unit 551 outputs a motor control signal CONT to control the motors 553 . The motors 553 are connected to the blocking plates P 1 to P 6 of the blind 530 .

Referring to FIG. 4 , the motor M 1 , motor M 2 , motor M 3 , motor M 4 , motor M 5 , and motor M 6 are each connected to one of the blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 . For example, a first motor M 1 may be connected to a first blocking plate P 1 . A second motor M 2 may be connected to a second blocking plate P 2 . A third motor M 3 may be connected to a third blocking plate P 3 . A fourth motor M 4 may be connected to a fourth blocking plate P 4 . A fifth motor M 5 may be connected to a fifth blocking plate P 5 . A sixth motor M 6 may be connected to a sixth blocking plate P 6 . The motor M 1 , motor M 2 , motor M 3 , motor M 4 , motor M 5 , and motor M 6 may be connected to the blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 through a chain. Although not shown in the figures, the blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 may be moved on additional guide rails.

The motors 553 move blocking plate P 1 , blocking plate P 2 , blocking plate P 3 , blocking plate P 4 , blocking plate P 5 , and blocking plate P 6 in response to the motor control signal CONT. The motor control signal CONT may include a moving signal to move the blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 in the first direction D 1 and a return signal to move the blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 in a second direction D 2 opposite to the first direction D 1 . The motors 553 move the blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 in the first direction D 1 in response to the moving signal. The motors 553 move or return the blocking plate P 1 , the blocking plate P 2 , the blocking plate P 3 , the blocking plate P 4 , the blocking plate P 5 , and the blocking plate P 6 in the second direction D 2 in response to the return signal.

The motor control unit 551 receives the laser oscillation start signal Q_TR from the light source driver 511 . The motor control signal CONT of the motor control unit 551 is synchronized with the laser oscillation start signal Q_TR. The return signal in the motor control signal CONT may also be synchronized with the laser oscillation start signal Q_TR.

The mask 570 is disposed over the substrate 2000 , and is disposed under the blind 530 . The mask 570 includes the exposure window 571 transmitting the light irradiated from the light source 510 . A pattern is formed in the exposure window 571 to selectively transmit the light irradiated from the light source 510 . The mask 570 may include the patterns for a rectangular shape pixel or a zigzag shape pixel.

The exposure window 571 may have a rectangular shape. For example, a width W in the first direction D 1 may be about 60 mm.

The image processor 590 is disposed under the substrate 2000 and the mask 570 . The image processor 590 reads a preset pattern formed on the substrate 2000 to correct alignment between the substrate 2000 and the mask 570 .

FIG. 5 is a plan view of the blocking plate of FIG. 2 . FIG. 5 illustrates a shape of the first blocking plate P 1 among the blocking plates of FIG. 2 .

Referring to FIG. 2 , FIG. 3 , FIG. 4 , and FIG. 5 , the first blocking plate P 1 includes the blocking portion and the opening portion. The first blocking plate P 1 may include a plurality of opening portions. The blocking portion and the opening portion of the first blocking plate P 1 may be alternately disposed in the first direction D 1 .

The opening portion of the first blocking plate P 1 may extend in a direction substantially perpendicular to the first direction D 1 . The opening portion may have a rectangular shape.

The opening portion of the first blocking plate P 1 has a first width W 1 in the first direction D 1 . The blocking portion of the first blocking plate P 1 has a second width W 2 in the first direction D 1 . The first width W 1 of the opening portion may be smaller than or equal to the second width W 2 of the blocking portion. A sum of the second widths W 2 of all blocking portions of the first blocking plate P 1 may be larger than or equal to ½ of a width of the first blocking plate P 1 in the first direction D 1 .

For example, the width of the first blocking plate P 1 in the first direction D 1 may be 18 mm. The first blocking plate P 1 may include four opening portions. The first width W 1 of the opening portion may be 2 mm. The second width W 2 of the blocking portion may also be 2 mm.

The second blocking plate P 2 overlaps with the first blocking plate P 1 and may have a shape substantially the same as the first blocking plate P 1 .

FIG. 6 is a cross-sectional view of the blocking plate of FIG. 2 . FIG. 6 illustrates the operation of the blocking plate in an exposure process.

Referring to FIG. 6 , the first blocking plate P 1 and the second blocking plate P 2 are disposed in an area corresponding to the non-exposed area of the substrate 2000 to prevent the light from being irradiated to the non-exposed area of the substrate 2000 .

The first blocking plate P 1 and the second blocking plate P 2 overlap with each other so that the opening portions of the first blocking plate P 1 and the second blocking plate P 2 are completely blocked. The opening portion of the first blocking plate P 1 is blocked by the blocking portion of the second blocking plate P 2 . The opening portion of the second blocking plate P 2 is blocked by the blocking portion of the first blocking plate P 1 .

The substrate 2000 , the first blocking plate P 1 , and the second blocking plate P 2 are moved along the first direction D 1 . A moving velocity of the first blocking plate P 1 and the second blocking plate P 2 in the first direction D 1 may be substantially the same as a moving velocity of the substrate 2000 in the first direction D 1 .

FIG. 7 is a cross-sectional view of the blocking plate of FIG. 2 and a gray region formed by the blocking plate. FIG. 8 is an enlarged cross-sectional view of a portion A of FIG. 7 .

FIG. 7 illustrates a returning operation of the blocking plates of FIG. 2 which results in the blocking plates moving in the second direction D 2 . The blocking plate P 1 and the blocking plate P 2 are moved in the first direction D 1 to block the non-exposed area. And then, the blocking plate P 1 and the blocking plate P 2 are returned in the second direction D 2 opposite to the first direction D 1 to block a next non-exposed area. When the blocking plate P 1 and the blocking plate P 2 are returned during a light emitting time, the blocking plate P 1 and the blocking plate P 2 block the light irradiated to an exposed area of the substrate 2000 so that a stain may appear in the exposed area of the substrate 2000 .

Referring to FIG. 7 and FIG. 8 , the blocking plate P 1 and the blocking plate P 2 are returned independent from each other. When the first blocking plate P 1 is returned in the second direction D 2 during the light emitting time, the light is irradiated to regions of the mask 570 and the substrate 2000 corresponding to the opening portion of the first blocking plate P 1 . Thus, a stain does not appear in the region of the substrate 2000 corresponding to the opening portion.

When, the light is irradiated to the substrate 2000 in a direction exactly perpendicular to the substrate 2000 , the light is not irradiated to regions of the mask 570 and the substrate 2000 corresponding to the blocking portion of the first blocking plate P 1 . Thus, a stain may appear in the region of the substrate 2000 corresponding to the blocking portion.

However, the light source may not generate an exactly perpendicular light so that the light irradiated to the substrate 2000 has an inclined angle CA with respect to the direction perpendicular to the substrate 2000 . The light may be irradiated to the region of the substrate 2000 corresponding to the blocking portion of the first blocking plate P 1 by the inclined angle CA. A region on the mask 570 corresponding to the blocking portion, to which the inclined light is irradiated, is known as a gray region.

Referring to FIG. 8 , a first gray region GA 1 is formed by a first end of the blocking portion of the first blocking plate P 1 . A second gray region GA 2 is formed by a second end of the blocking portion of the first blocking plate P 1 .

A width of the gray region on the mask 570 extending in a second direction D 2 from a line perpendicular to the first end of the blocking portion of the first blocking plate P 1 is as follows: DG=DB×tan CA. Herein, DB is a distance between the first blocking plate P 1 and the mask 570 . CA is the inclined angle with respect to the direction perpendicular to the substrate 2000 . Thus, the width of the gray region on the mask 570 in both directions with respect to the first end of the blocking portion of the first blocking plate P 1 may be 2 DG.

A width of the first gray region GA 1 may be substantially the same as 2 DG. A width of the second gray region GA 2 may be substantially the same as 2 DG.

When the region on the mask 570 corresponding to the blocking portion of the first blocking plate P 1 is covered by the first gray region GA 1 and the second gray region GA 2 , the stain in the region of the substrate 2000 corresponding to the blocking portion of the first blocking plate P 1 may be decreased.

The region on the mask 570 corresponding to the blocking portion of the first blocking plate P 1 may be partially covered by the first gray region GA 1 and the second gray region GA 2 . Alternatively, the region on the mask 570 corresponding to the blocking portion of the first blocking plate P 1 may be entirely covered by the first gray region GA 1 and the second gray region GA 2 .

When the second width W 2 of the blocking portion is equal to or smaller than the width of the gray region of 2 DG, the region on the mask 570 corresponding to the blocking portion of the first blocking plate P 1 may be entirely covered by the first gray region GA 1 and the second gray region GA 2 .

The second blocking plate P 2 may be returned in the second direction D 2 in the same manner as the first blocking plate P 1 . In the returning process of the second blocking plate P 2 , the light emitting time may be adjusted such that the light may be emitted when the second blocking plate P 2 is disposed in a different position from the first blocking plate P 1 in the returning process of the first blocking plate P 1 .

FIG. 9 is a cross-sectional view of a blocking plate and a gray region according to an exemplary embodiment of the present invention.

The exposure apparatus and the method of driving the exposure apparatus are substantially the same as the exposure apparatus and the method of driving the exposure apparatus described with reference to FIG. 1 , FIG. 2 , FIG. 3 , FIG. 4 , FIG. 5 , FIG. 6 , FIG. 7 , and FIG. 8 except that the plurality of blocking plates overlap each other in the returning operation. Thus, descriptions of common elements are omitted for clarity.

Referring to FIG. 9 , the first blocking plate P 1 and the second blocking plate P 2 overlap with each other and are returned simultaneously. The first blocking plate P 1 and the second blocking plate P 2 are disposed such that the opening portion of the first blocking plate P 1 corresponds to the opening portion of the second blocking plate P 2 .

The opening portion of the first blocking plate P 1 overlaps with the opening portion of the second blocking plate P 2 . The blocking portion of the first blocking plate P 1 overlaps with the blocking portion of the second blocking plate P 2 .

In the returning process of the first blocking plate P 1 in FIG. 7 and FIG. 8 , a weak stain may appear in a first region of the exposure area of the substrate 2000 . In the returning process of the second blocking plate P 2 in FIG. 7 and FIG. 8 , a weak stain may appear in a second region of the exposure area of the substrate 2000 . A weak stain may appear in a first region of the exposure area of the substrate 2000 because the first blocking plate P 1 and the second blocking plate P 2 return simultaneously in FIG. 9 .

An area of the substrate 2000 , in which the stain appears, may be decreased compared with the returning process of FIG. 7 and FIG. 8 . Furthermore, the returning process of the blocking plates may be expedited.

FIG. 10 is a plan view of a blocking plate according to an exemplary embodiment of the present invention. FIG. 10 illustrates a shape of a first blocking plate P 1 among a plurality of blocking plates.

The exposure apparatus and the method of driving the exposure apparatus are substantially the same as the exposure apparatus and the method of driving the exposure apparatus described with reference to FIG. 1 , FIG. 2 , FIG. 3 , FIG. 4 , FIG. 5 , FIG. 6 , FIG. 7 , and FIG. 8 except for the number of the blocking plates included in a blocking plate group and the shape of the blocking plate. Thus, descriptions of common elements are omitted for clarity.

A first blocking plate group may include a first blocking plate P 1 , a second blocking plate P 2 and a third blocking plate P 3 . The first blocking plate P 1 , the second blocking plate P 2 , and the third blocking plate P 3 overlap with each other so that a blocking portion of the first blocking plate P 1 may cover opening portions of the second blocking plate P 2 and third blocking plate P 3 , a blocking portion of the second blocking plate P 2 may cover opening portions of the first blocking plate P 1 and the third blocking plate P 3 , and a blocking portion of the third blocking plate P 3 may cover opening portions of the first blocking plate P 1 and the second blocking plate P 2 . Thus, the first blocking plate P 1 , the second blocking plate P 2 and the third blocking plate P 3 in the first blocking plate group may function as a blind blocking a non-exposed area of the substrate 2000 .

The first blocking plate P 1 , the second blocking plate P 2 , and the third blocking plate P 3 may have substantially the same width in the first direction D 1 .

Referring to FIG. 10 , the first blocking plate P 1 includes the blocking portion and the opening portion. The first blocking plate P 1 may include a plurality of opening portions. The blocking portion and the opening portion of the first blocking plate P 1 may be alternately disposed in the first direction D 1 .

The opening portion of the first blocking plate P 1 may extend in a direction substantially perpendicular to the first direction D 1 . The opening portion may have a rectangular shape.

The opening portion of the first blocking plate P 1 has a first width W 1 in the first direction D 1 . The blocking portion of the first blocking plate P 1 has a second width W 2 in the first direction D 1 . The first width W 1 of the opening portion may be smaller than or equal to twice of the second width W 2 of the blocking portion. A sum of the second widths W 2 of all blocking portions of the first blocking plate P 1 may be larger than or equal to ⅓ of a width of the first blocking plate P 1 in the first direction D 1 .

The second blocking plate P 2 and third blocking plate P 3 overlap with the first blocking plate P 1 and may have a shape substantially the same as the first blocking plate P 1 .

FIG. 11 is a cross-sectional view of the blocking plate of FIG. 10 . FIG. 11 illustrates an exposure process.

Referring to FIG. 11 , the first blocking plate P 1 , the second blocking plate P 2 , and the third blocking plate P 3 are disposed in an area corresponding to the non-exposed area of the substrate 2000 to prevent the light from being irradiated to the non-exposed area of the substrate 2000 .

The first blocking plate P 1 , the second blocking plate P 2 , and the third blocking plate P 3 overlap with one another so that the opening portions of the first blocking plate P 1 , the second blocking plate P 2 , and the third blocking plate P 3 are completely blocked. The opening portion of the first blocking plate P 1 is blocked by the blocking portions of the second blocking plate P 2 , and the blocking portions of the third blocking plate P 3 . The opening portion of the second blocking plate P 2 is blocked by the blocking portions of the first blocking plate P 1 and the blocking portions of the third blocking plate P 3 . The opening portion of the third blocking plate P 3 is blocked by the blocking portions of the first blocking plate P 1 and the blocking portions of the second blocking plate P 2 .

The substrate 2000 and the first blocking plate P 1 , the second blocking plate P 2 , and the third blocking plate P 3 are moved along the first direction D 1 . A moving velocity of the first blocking plate P 1 , the second blocking plate P 2 , and the third blocking plate P 3 in the first direction D 1 may be substantially the same as a moving velocity of the substrate 2000 in the first direction D 1 .

FIG. 12 is a cross-sectional view of the blocking plate of FIG. 10 according to an exemplary embodiment of the present invention. FIG. 12 illustrates a returning operation of the blocking plate and gray region formed of FIG. 10 . FIG. 13 is an enlarged cross-sectional view of a portion B of FIG. 12 .

The blocking plate P 1 , the blocking plate P 2 , and the blocking plate P 3 are moved in the first direction D 1 to block the non-exposed area. And then, the blocking plate P 1 , the blocking plate P 2 , and the blocking plate P 3 are returned in the second direction D 2 opposite to the first direction D 1 to block a next non-exposed area. When the blocking plate P 1 , the blocking plate P 2 , and the blocking plate P 3 are returned during a light emitting time, the blocking plate P 1 , the blocking plate P 2 , and the blocking plate P 3 block the light irradiated to an exposed area of the substrate 2000 so that a stain may appear in the exposed area of the substrate 2000 .

Referring to FIG. 12 and FIG. 13 , the blocking plate P 1 , the blocking plate P 2 , and the blocking plate P 3 are returned independent of each other. When the first blocking plate P 1 is returned in the second direction D 2 during the light emitting time, the light is irradiated to regions of the mask 570 and the substrate 2000 corresponding to the opening portion of the first blocking plate P 1 . Thus, a stain is not shown in the region of the substrate 2000 corresponding to the opening portion.

When, the light is irradiated to the substrate 2000 in a direction exactly perpendicular to the substrate 2000 , the light is not irradiated to regions of the mask 570 and the substrate 2000 corresponding to the blocking portion of the first blocking plate P 1 . Thus, a stain may appear in the region of the substrate 2000 corresponding to the blocking portion.

However, the light source may not generate an exactly perpendicular light so that the light irradiated to the substrate 2000 may have an inclined angle CA with respect to the direction perpendicular to the substrate 2000 . The light may be irradiated to the region of the substrate 2000 corresponding to the blocking portion of the first blocking plate P 1 by the inclined angle CA. A region on the mask 570 corresponding to the blocking portion, to which the inclined light is irradiated, is known as a gray region.

Referring to FIG. 13 , a first gray region GA 1 is formed by a first end of the blocking portion of the first blocking plate P 1 . A second gray region GA 2 is formed by a second end of the blocking portion of the first blocking plate P 1 .

A width of the gray region on the mask 570 extending in a second direction D 2 from a line perpendicular to the first end of the blocking portion of the first blocking plate P 1 is as follows: DG=DB×tan CA. Herein, DB is a distance between the first blocking plate P 1 and the mask 570 . CA is the inclined angle with respect to the direction perpendicular to the substrate 2000 . Thus, the width of the gray region on the mask 570 in both directions with respect to the first end of the blocking portion of the first blocking plate P 1 may be 2 DG.

When the second width W 2 of the blocking portion is equal to or smaller than the width of the gray region of 2 DG, the region on the mask 570 corresponding to the blocking portion of the first blocking plate P 1 may be entirely covered by the first gray region GA 1 and the second gray region GA 2 .

The second blocking plate P 2 may be returned in the second direction D 2 in the same manner as the first blocking plate P 1 . In the returning process of the second blocking plate P 2 , the light emitting time may be adjusted such that the light may be emitted when the second blocking plate P 2 is disposed in a different position from the first blocking plate P 1 in the returning process of the first blocking plate P 1 .

The third blocking plate P 3 may be returned in the second direction D 2 in the same manner as the first blocking plate P 1 . In the returning process of the third blocking plate P 3 , the light emitting time may be adjusted such that the light may be emitted when the third blocking plate P 3 is disposed in a different position from the first blocking plate P 1 and the second blocking plate P 2 in the returning process of the first blocking plate P 1 and the second blocking plate P 2 .

A ratio of the blocking portion to the opening portion may be decreased compared with that of FIG. 5 so that an area of the substrate 2000 , in which the stain appears, may be decreased.

FIG. 14 is a cross-sectional view of a blocking plate and a gray area according to an exemplary embodiment of the present invention.

The exposure apparatus and the method of driving the exposure apparatus are substantially the same as the exposure apparatus and the method of driving the exposure described with reference to FIG. 10 , FIG. 11 , FIG. 12 , and FIG. 13 except that the plurality of blocking plates overlap with each other in the returning operation. Thus, descriptions of common elements are omitted for clarity.

Referring to FIG. 14 , the first blocking plate P 1 , the second blocking plate P 2 , and the third blocking plate P 3 overlap with one another and are returned simultaneously. The first blocking plate P 1 , the second blocking plate P 12 , and the third blocking plate P 3 are disposed such that the opening portions of the first blocking plate P 1 , the second blocking plate P 2 and the third blocking plate P 3 correspond to one another.

The opening portion of the first blocking plate P 1 overlaps with the opening portions of the second blocking plate P 2 and the third blocking plate P 3 . The blocking portion of the first blocking plate P 1 overlaps with the blocking portions of the second blocking plate P 2 and the third blocking plate P 3 .

In the returning process of the first blocking plate P 1 in FIG. 12 and FIG. 13 , a weak stain may appear in a first region of the exposure area of the substrate 2000 . In the returning process of the second blocking plate P 2 in FIG. 12 and FIG. 13 , a weak stain may appear in a second region of the exposure area of the substrate 2000 . In the returning process of the third blocking plate P 3 in FIG. 12 and FIG. 13 , a weak stain may appear in a third region of the exposure area of the substrate 2000 . A weak stain may appear in a first region of the exposure area of the substrate 2000 because the first blocking plate P 1 , the second blocking plate P 2 , and the third blocking plate blocking plate P 3 are returned simultaneously in FIG. 14 .

In the returning process of FIG. 14 an area of the substrate 2000 in which the stain appears may be decreased. Furthermore, the returning process of the blocking plates may be expedited.

FIG. 15 is a plan view of a blocking plate according to an exemplary embodiment of the present invention. FIG. 15 illustrates a shape of a first blocking plate P 1 among a plurality of blocking plates.

The exposure apparatus and the method of driving the exposure apparatus are substantially the same as the exposure apparatus and the method of driving the exposure described with reference to FIG. 1 , FIG. 2 , FIG. 3 , FIG. 4 , FIG. 5 , FIG. 6 , FIG. 7 , and FIG. 8 except for the shape of the blocking plate. Thus, descriptions of common elements are omitted for clarity.

Referring to FIG. 15 , the first blocking plate P 1 includes a blocking portion and an opening portion. The first blocking plate P 1 may include a plurality of opening portions. The blocking portion and the opening portion of the first blocking plate P 1 may be alternately disposed in the first direction D 1 .

The opening portions may be arranged in a checkerboard pattern. The opening portion may have a substantially rectangular shape. For example, the opening portion may have a square shape.

The second blocking plate P 2 overlaps with the first blocking plate P 1 and may have a shape substantially the same as the first blocking plate P 1 .

According to an exemplary embodiment, the blocking portion and the opening portion of the first blocking plate P 1 are alternately disposed in the first direction D 1 so that a stain in the first direction D 1 may be decreased. In addition, the blocking portion and the opening portion of the first blocking plate P 1 are alternately disposed in a direction perpendicular to the first direction D 1 so that a stain may not easily appear to a user.

FIG. 16 is a plan view of a blocking plate according to an exemplary embodiment of the present invention. FIG. 16 illustrates a shape of a first blocking plate P 1 among a plurality of blocking plates.

The exposure apparatus and the method of driving the exposure apparatus are substantially the same as the exposure apparatus and the method of driving the exposure apparatus described with reference to FIG. 1 , FIG. 2 , FIG. 3 , FIG. 4 , FIG. 5 , FIG. 6 , FIG. 7 , and FIG. 8 except for the shape of the blocking plate. Thus, descriptions of common elements are omitted for clarity.

Referring to FIG. 16 , the first blocking plate P 1 includes a blocking portion and an opening portion. The first blocking plate P 1 may include a plurality of opening portions. The blocking portion and the opening portion of the first blocking plate P 1 may be alternately disposed in the first direction D 1 .

The opening portions may be arranged in a checkerboard pattern. The opening portion may have a substantially oval shape. For example, the opening portion may have a circular shape.

The second blocking plate P 2 overlaps with the first blocking plate P 1 and may have a shape substantially the same as the first blocking plate P 1 .

According to the present exemplary embodiment, the blocking portion and the opening portion of the first blocking plate P 1 are alternately disposed in the first direction D 1 so that a stain in the first direction D 1 may be decreased. In addition, the blocking portion and the opening portion of the first blocking plate P 1 are alternately disposed in a direction perpendicular to the first direction D 1 so that a stain may not easily appear to a user.

Thus, the blocking plate includes the opening portion so that a stain on the substrate may be decreased. Thus, a display quality of the display panel manufactured by the exposure apparatus may be improved.

According to an exemplary embodiment of an exposure apparatus and exemplary embodiments of a method of driving the exposure apparatus, a blocking plate includes an opening portion so that a stain on a substrate due to the blocking plate may be prevented when the blocking plate is returned. Thus, display quality of a liquid crystal display panel may be improved.

It will be apparent to those skilled in the art that various modifications and variation can be made in the present invention without departing from the spirit or scope of the invention. Thus, it is intended that the present invention cover the modifications and variations of this invention provided they come within the scope of the appended claims and their equivalents.