Inventor
Takezo Sano
Inventor
Takatsuki, JP
Overview
Patents· 43 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B01Dprimary
B01DSeparation11%
H01HElectric switches10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
B29CShaping or joining of plastics7%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification6%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts5%
C08JWorking-up5%
D06MTreatment, not provided for elsewhere in class d06, of fibres, threads, yarns, fabrics, feathers or fibrous goods made from such materials5%
PatentTitleYear
5,126,709'Electromagnetic relay'19925,084,598'Electric switch for a power tool'19925,017,747'Microswitch'19914,993,787'Electromagnetic relay'19914,904,832'Microswitch'19904,881,053'Electromagnetic relay'19894,727,344'Electromagnetic drive and polarized relay'19884,656,733'Method of manufacture of base assembly for an electromagnetic relay'19874,658,226'Electromagnetic relay with linearly moving block assembly'19874,626,813'Electromagnetic drive and polarized relay'19864,470,786'Molding apparatus with retractable preform support pins'19844,330,406'Semipermeable membrane and process of making same'19824,302,528'Process for producing photo-curable composite materials useful for preparing stencils'19814,297,945'Resin original pattern plate and method for transferring relieved pattern thereof to thermoplastic resin material'19814,288,529'Use of photo-curable composite materials to make a stencil'19814,272,378'Semipermeable membrane'19814,268,662'Process for improving semipermeable membranes by treating with protic acids or inorganic salts'19814,265,959'Process for producing semipermeable membranes'19814,247,621'Original pattern plate obtained by use of photo-sensitive resin composition'19814,223,117'Process for producing olefin polymers'19804,216,287'Photo-curable composite containing a screen material in a liquid resin'19804,200,735'Cellulosic ion exchange fibers and method for preparing same'19804,193,798'Process for producing printing resin plates using liquid photosensitive resins'19804,188,273'Process for preparing novel thin films'19804,163,725'Process for preparing of semipermeable membranes'19794,156,389'Resin original pattern plate and method for transferring relieved pattern thereof to thermoplastic resin material'19794,147,745'Process for producing semipermeable membranes'19794,140,605'Crosslinkable composition'19794,113,666'Method for producing strong-acid cation exchange fiber by treating fibrous polyethylene with gaseous sulfur trioxide'19784,107,049'Process for producing semipermeable membranes'19784,098,979'Method for preparing easily processable polyolefin granule'19784,092,250'Filters for the selective collection of metallic ions'19784,089,816'Cation exchanger'19784,083,904'Method for manufacturing phosphorylated cellulose ester membranes for use in the separation or concentration of substances'19784,080,171'Rapid analysis of trace components contained in a liquid'19784,079,159'Original plate for producing matrix'19784,056,456'Process for preparing novel thin films'19774,046,843'Process for preparing membranes for separation of substances'19773,997,644'Method for manufacturing novel cation exchangers'19763,992,495'Method of manufacturing a semipermeable membrane from a water-soluble polymeric resin'19763,967,932'Rapid analysis of cation contained in liquid'19763,962,212'Phosphorylated cellulose ester membrane for use in separation or concentration of substances'19763,960,685'Photosensitive resin composition containing pullulan or esters thereof'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1982Patents assigned to SUMITOMO CHEMICAL CO (32)· patent assignee history
1976–1982Based in Takatsuki, JP· patent location history
1976–1981Based in Ibaragi, JP· patent location history
1984–1992Patents assigned to OMRON TATEISI ELECTRONICS CO (11)· patent assignee history
1984–1992Based in Shiga, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SUMITOMO CHEMICAL CO | 32 | 1976–1982 |
| OMRON TATEISI ELECTRONICS CO | 11 | 1984–1992 |
Locations
| Location | Patents | Span |
|---|---|---|
| Takatsuki, JP | 26 | 1976–1982 |
| Shiga, JP | 11 | 1984–1992 |
| Ibaragi, JP | 6 | 1976–1981 |