Inventor

Magdy S. Abdelrahman

Inventor

Santa Clara, CA, US

Overview

3→

Patents

2004–2010

Patent span

Electricity

Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1029%

B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts14%

C08JWorking-up14%

Y02WClimate change mitigation technologies related to wastewater treatment or waste management14%

PatentTitleYear

7,659,196'Soluble hard mask for interlayer dielectric patterning'2010 7,649,264'Hard mask for low-k interlayer dielectric patterning'2010 6,815,510'Elastomer reclaiming composition and method'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004Based in Lincoln, NE, US· patent location history

2010Patents assigned to INTEL CORP (2)· patent assignee history

2010Based in Santa Clara, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
INTEL CORP	2	2010

Locations

Location	Patents	Span
Santa Clara, California, US	2	2010
Lincoln, NE, US	1	2004