Inventor
Ryo Nakagaki
Inventor
Kawasaki, JP
Overview
Patents· 47 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G06Tprimary
G06TImage data processing or generation, in general26%
G01NInvestigating or analysing materials by determining their chemical or physical properties21%
H01JElectric discharge tubes or discharge lamps14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
H01LSemiconductor devices8%
G06FElectric digital data processing6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
G06VImage or video recognition or understanding3%
G06KGraphical data reading2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
10,783,625Method for measuring overlay and measuring apparatus, scanning electron microscope, and GUI202010,203,851Defect classification apparatus and defect classification method20199,811,897'Defect observation method and defect observation device'20179,799,112'Method for measuring overlay and measuring apparatus, scanning electron microscope, and GUI'20179,685,301'Charged-particle radiation apparatus'20179,582,875'Defect analysis assistance device, program executed by defect analysis assistance device, and defect analysis system'20179,569,836'Defect observation method and defect observation device'20179,401,015'Defect classification method, and defect classification system'20169,390,490'Method and device for testing defect using SEM'20169,342,879'Method and apparatus for reviewing defect'20169,335,277'Region-of-interest determination apparatus, observation tool or inspection tool, region-of-interest determination method, and observation method or inspection method using region-of-interest determination method'20169,311,697'Inspection method and device therefor'20169,082,585'Defect observation method and device using SEM'20159,040,937'Charged particle beam apparatus'20158,824,773'Defect observation method and defect observation device'20148,731,275'Method and apparatus for reviewing defects'20148,634,634'Defect observation method and defect observation apparatus'20148,581,976'Method and apparatus for reviewing defects of semiconductor device'20138,526,710'Defect review method and apparatus'20138,452,076'Defect classifier using classification recipe based on connection between rule-based and example-based classifiers'20138,428,336'Inspecting method, inspecting system, and method for manufacturing electronic devices'20138,355,559'Method and apparatus for reviewing defects'20138,150,141'Defect classifier using classification recipe based on connection between rule-based and example-based classifiers'20128,121,397'Method and its apparatus for reviewing defects'20128,090,190'Method and apparatus for reviewing defects'20127,991,217'Defect classifier using classification recipe based on connection between rule-based and example-based classifiers'20117,932,493'Method and system for observing a specimen using a scanning electron microscope'20117,873,202'Method and apparatus for reviewing defects of semiconductor device'20117,834,317'Scanning electron microscope and system for inspecting semiconductor device'20107,657,078'Method and apparatus for reviewing defects'20107,598,490'SEM-type reviewing apparatus and a method for reviewing defects using the same'20097,511,272'Method for controlling charged particle beam, and charged particle beam apparatus'20097,483,560'Method for measuring three dimensional shape of a fine pattern'20097,476,856'Sample dimension-measuring method and charged particle beam apparatus'20097,408,155'Measuring method and its apparatus'20087,399,964'Electron microscope, measuring method using the same, electron microscope system, and method for controlling the system'20087,356,177'Defect image classifying method and apparatus and a semiconductor device manufacturing process based on the method and apparatus'20087,216,311'System and method for evaluating a semiconductor device pattern, method for controlling process of forming a semiconductor device pattern and method for monitoring a semiconductor device manufacturing process'20077,164,127'Scanning electron microscope and a method for evaluating accuracy of repeated measurement using the same'20077,154,090'Method for controlling charged particle beam, and charged particle beam apparatus'20067,113,628'Defect image classifying method and apparatus and a semiconductor device manufacturing process based on the method and apparatus'20067,068,834'Inspecting method, inspecting system, and method for manufacturing electronic devices'20067,034,299'Transmission electron microscope system and method of inspecting a specimen using the same'20066,913,861'Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device'20056,657,221'Image classification method, observation method, and apparatus thereof with different stage moving velocities'20036,553,323'Method and its apparatus for inspecting a specimen'20036,476,388'Scanning electron microscope having magnification switching control'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2013Patents assigned to HITACHI LTD (7)· patent assignee history
2002–2016Based in Kawasaki, JP· patent location history
2003–2020Based in Tokyo, JP· patent location history
2005–2020Patents assigned to HITACHI HIGH TECH CORP (39)· patent assignee history
2012–2016Patents assigned to NAKAGAKI RYO (17)· patent assignee history
2012–2016Patents assigned to HARADA MINORU (9)· patent assignee history
2013–2016Patents assigned to HIRAI TAKEHIRO (8)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI HIGH TECH CORP | 39 | 2005–2020 |
| NAKAGAKI RYOself | 17 | 2012–2016 |
| HARADA MINORU | 9 | 2012–2016 |
| HIRAI TAKEHIRO | 8 | 2013–2016 |
| HITACHI LTD | 7 | 2002–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 35 | 2002–2016 |
| Tokyo, JP | 12 | 2003–2020 |