Inventor
Ren e De Keyzer
Inventor
Waasmunster, BE
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Cprimary
G03CPhotosensitive materials for photographic purposes40%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997Patents assigned to AGFA GEVAERT NV (2)· patent assignee history
1997Based in Waasmunster, BE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGFA GEVAERT NV | 2 | 1997 |
Locations
| Location | Patents | Span |
|---|---|---|
| Waasmunster, BE | 2 | 1997 |