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Inventor

Maohua REN

Inventor
CN

Overview

4→
Patents
2023–2026
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
H01LSemiconductor devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
G01BMeasuring length, thickness or similar linear dimensions7%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
PatentTitleYear
12,560,555Method for aligning to a pattern on a wafer202612,216,072Reticle thermal expansion calibration method capable of improving sub-recipe202512,204,247Lithography film stack and lithography method202511,692,946Method for aligning to a pattern on a wafer2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2026Patents assigned to UNITED SEMICONDUCTOR XIAMEN CO LTD (4)· patent assignee history
2023–2026Based in CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
UNITED SEMICONDUCTOR XIAMEN CO LTD42023–2026
Locations
LocationPatentsSpan
CN42023–2026