Inventor
Kana Fujii
Inventor
Shizuoka, JP
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
Y10TTechnical subjects covered by former us classification9%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
B23BTurning2%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%
C07CAcyclic or carbocyclic compounds2%
C07DHeterocyclic compounds2%
PatentTitleYear
10,248,019Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film201910,126,653Pattern forming method and resist composition20189,897,922'Method of forming pattern and developer for use in the method'20189,709,892'Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same'20179,551,935'Pattern forming method and resist composition'20179,482,958'Method of forming pattern and developer for use in the method'20169,122,151'Resist composition, resist film therefrom and method of forming negative pattern using the composition'20159,097,973'Method of forming pattern and developer for use in the method'20158,877,423'Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same'20148,871,642'Method of forming pattern and developer for use in the method'20148,859,192'Negative pattern forming method and resist pattern'20148,795,945'Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same'20148,741,542'Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same'20148,647,812'Pattern forming method, chemical amplification resist composition and resist film'20148,642,245'Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same'20148,541,161'Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method'20138,349,535'Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2019Patents assigned to FUJIFILM CORP (17)· patent assignee history
2013–2018Patents assigned to FUJII KANA (13)· patent assignee history
2013–2014Patents assigned to FUJIMORI TORU (6)· patent assignee history
2013–2019Based in Shizuoka, JP· patent location history
2013–2017Based in Haibara-gun, JP· patent location history
2014–2018Patents assigned to TARUTANI SHINJI (6)· patent assignee history
2014–2018Patents assigned to ENOMOTO YUICHIRO (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 17 | 2013–2019 |
| FUJII KANAself | 13 | 2013–2018 |
| FUJIMORI TORU | 6 | 2013–2014 |
| TARUTANI SHINJI | 6 | 2014–2018 |
| ENOMOTO YUICHIRO | 5 | 2014–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 15 | 2013–2019 |
| Haibara-gun, JP | 2 | 2013–2017 |