Inventor
KEISUKE HASHIMOTO
Inventor
JP
Overview
Patents· 33 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
H01LSemiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
G06FElectric digital data processing4%
C08LCompositions of macromolecular compounds4%
G09FDisplaying2%
G16HHealthcare informatics, i.e. information and communication technology [ict] specially adapted for the handling or processing of medical or healthcare data2%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds1%
PatentTitleYear
12,597,498Medication use support system202612,589,038Mobile diagnosis system and transport management device202612,529,701Method for predicting sensitivity of cancer cell to GPX4 inhibitor202612,449,732Composition for forming resist underlayer film with improved film density202512,422,898Foldable assembly and foldable display device202512,405,533Resist underlayer film-forming composition containing substituted crosslinkable compound202512,386,262Resist underlayer film-forming composition using carbon-oxygen double bond202512,336,123Foldable display device and supporting assembly thereof202512,332,566Resist underlayer film-forming composition202512,242,196Resist underlayer film-forming composition containing indolocarbazole novolak resin202512,147,158Photocurable composition and method for producing semiconductor device202412,092,854Foldable display device202412,080,386Diagnosis/treatment assisting apparatus and diagnosis/treatment assisting system202412,072,630Resist underlayer film-forming composition including cyclic carbonyl compound202412,072,629Resist underlayer film-forming composition containing novolac resin to which aromatic vinyl compound is added202412,025,916Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added202411,874,580Foldable electrophoretic display module including non-conductive support plate202411,834,228Cap202311,798,810Resist underlayer film-forming composition containing amide solvent202311,741,035Circuit device and electronic apparatus202311,720,024Resist underlayer film-forming composition containing indolocarbazole novolak resin202311,681,223Photocurable composition and method for producing semiconductor device202311,674,051Stepped substrate coating composition containing compound having curable functional group202311,650,505Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound202311,592,747Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin202311,513,415Foldable electrophoretic display module including non-conductive support plate202211,506,980Resist underlayer film forming composition using a fluorene compound202211,385,546Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms202211,339,242Method for manufacturing semiconductor substrate having group-III nitride compound layer202211,333,693Frequency measurement apparatus, microcontroller, and electronic apparatus202211,300,879Resist underlayer film forming composition containing triaryldiamine-containing novolac resin202211,199,777Resist underlayer film-forming composition containing novolac polymer having secondary amino group202111,199,775Resist underlayer film-forming composition containing naphthol aralkyl resin2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to NISSAN CHEMICAL CORP (14)· patent assignee history
2021–2025Patents assigned to NISSAN CHEMICAL IND LTD (7)· patent assignee history
2021–2026Based in JP· patent location history
2022–2024Patents assigned to E INK CORP (2)· patent assignee history
2024–2025Patents assigned to E INK HOLDINGS INC (3)· patent assignee history
2024–2026Patents assigned to CANON MEDICAL SYSTEMS CORP (2)· patent assignee history
2024–2025Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NISSAN CHEMICAL CORP | 14 | 2021–2025 |
| NISSAN CHEMICAL IND LTD | 7 | 2021–2025 |
| E INK HOLDINGS INC | 3 | 2024–2025 |
| CANON MEDICAL SYSTEMS CORP | 2 | 2024–2026 |
| E INK CORP | 2 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 30 | 2021–2026 |
| TW | 3 | 2024–2025 |