Inventor
GEOFFREY HOHN
Inventor
US
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H01JElectric discharge tubes or discharge lamps20%
H01LSemiconductor devices11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
B05CApparatus for applying fluent materials to surfaces, in general9%
H10DInorganic electric semiconductor devices3%
PatentTitleYear
12,331,402Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition202512,227,837Ex situ coating of chamber components for semiconductor processing202512,163,219Ex situ coating of chamber components for semiconductor processing202412,000,047Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition202411,920,239Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma202411,702,748Wafer level uniformity control in remote plasma film deposition202311,608,559Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition202311,365,479Ex situ coating of chamber components for semiconductor processing2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to LAM RES CORP (8)· patent assignee history
2022–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 8 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 8 | 2022–2025 |