LexDanaLexDanabeta
Inventor

Seiji Takeuchi

Inventor
Utsunomiya, JP

Overview

74→
Patents
1978–2021
Patent span
Physics
Primary field (CPC G)

Patents· 74 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
G01NInvestigating or analysing materials by determining their chemical or physical properties7%
G02BOptical elements, systems or apparatus7%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy7%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution7%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light5%
Y02PClimate change mitigation technologies in the production or processing of goods5%
Y10TTechnical subjects covered by former us classification4%
B65DContainers for storage or transport of articles or materials, e.g. bags, barrels, bottles, boxes, cans, cartons, crates, drums, jars, tanks, hoppers, forwarding containers3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
11,081,349Method of forming film on substrate and method of manufacturing liquid ejection head202110,682,044Spectrally encoded forward view and spectrally encoded multi-view endoscope using back-reflected light between reflective surfaces202010,656,463Display device202010,658,986Methods and apparatus for driver calibration202010,530,976Endoscope probes and systems, and methods for use therewith202010,444,146Optical probe, light intensity detection, imaging method and system201910,234,694Spectrally encoded probes201910,194,065Endoscope probes and systems, and methods for use therewith20199,453,906'Phase calibration circuit and method for multi-channel radar receiver'20169,164,370'Exposure apparatus and device manufacturing method using original with phase-modulation diffraction grating to form interference pattern'20157,688,424'Measurement apparatus, exposure apparatus, and device fabrication method'20107,675,629'Exposure apparatus and device manufacturing method using a common path interferometer to form an interference pattern and a processor to calculate optical characteristics of projection optics using the interference pattern'20107,573,563'Exposure apparatus and device manufacturing method'20097,508,493'Exposure apparatus and device manufacturing method'20097,466,395'Exposure apparatus and device manufacturing method using the apparatus'20087,416,814'Lithium secondary battery, and process for producing the same'20087,327,467'Phase measuring method and apparatus for measuring characterization of optical thin films'20087,290,124'Data processor employing register banks with overflow protection to enhance interrupt processing and task switching'20077,286,226'Method and apparatus for measuring birefringence'20077,273,681'Non-aqueous secondary battery having negative electrode including graphite powder'20077,262,920'Optical element and manufacturing method therefor'20077,251,029'Birefringence measurement apparatus, strain remover, polarimeter and exposure apparatus'20077,180,051'Polarization state detecting system, light source, and exposure apparatus'20077,164,372'Serial transmission system, its transmission-side circuit, and its reception-side circuit'20077,161,675'Beam splitting apparatus, transmittance measurement apparatus, and exposure apparatus'20077,102,828'Optical element and manufacturing method thereof'20067,095,497'Beam splitting apparatus, transmittance measurement apparatus, and exposure apparatus'20067,083,876'Lead-acid battery'20067,030,998'Phase measurement apparatus for measuring characterization of optical thin films'20067,015,456'Exposure apparatus that acquires information regarding a polarization state of light from a light source'20066,992,763'Beam splitting apparatus, transmittance measurement apparatus, and exposure apparatus'20066,967,796'Optical element and optical system'20056,907,536'Integrated circuit for image pickup device'20056,835,215'Non-aqueous secondary battery and a method of manufacturing graphite powder'20046,826,442'Stocker, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method'20046,642,792'Signal amplification device with circuit maintaining potential of input side of current mirror circuit at predetermined value'20036,638,662'Lithium secondary battery having oxide particles embedded in particles of carbonaceous material as a negative electrode-active material'20036,611,376'Diffractive optical element and method of manufacturing the same'20036,594,012'Exposure apparatus'20036,524,749'Lithium secondary battery, and process for producing the same'20036,383,467'Non-aqueous secondary battery and a method of manufacturing graphite powder'20026,295,118'Optical arrangement for exposure apparatus'20016,268,086'Non-aqueous secondary battery and a method of manufacturing graphite powder'20016,083,645'Secondary battery using system and material for negative electrode of secondary battery'20006,054,609'Method of separating isomers of nitrotoluic acid'20006,030,726'Lithium secondary battery having negative electrode of carbon material which bears metals'20005,861,952'Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position'19995,777,744'Exposure state detecting system and exposure apparatus using the same'19985,767,962'Inspection system and device manufacturing method using the same'19985,750,294'Best focus determining method'19985,742,386'Apparatus for detecting foreign matter on a substrate, and an exposure apparatus including the same'19985,652,657'Inspection system for original with pellicle'19975,610,715'Displacement detecting system, an expose apparatus, and a device manufacturing method employing a scale whose displacement is detected by a selected detection head'19975,585,918'Foreign particle inspecting system'19965,541,729'Measuring apparatus utilizing diffraction of reflected and transmitted light'19965,486,919'Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern'19965,461,474'Inspection apparatus for detecting foreign matter on a surface to be inspected, and an exposure apparatus and a device manufacturing method using the same'19955,448,356'Detecting device using a semiconductor light source emitting at least one laser beam in at least one predetermined direction'19955,404,220'Measuring method and measuring apparatus for determining the relative displacement of a diffraction grating with respect to a plurality of beams'19955,321,502'Measuring method and measuring apparatus'19944,894,355'Flexible, water-repellent baked carbon plate, its production, fuel cell electrode, fuel cell electrode plate and its production and fuel cell'19904,810,597'Fuel cell comprising a device for detecting the concentration of methanol'19894,684,026'Inflatable bags'19874,641,760'Inflatable bags'19874,639,682'Carrier reproducing circuit for phase shift keying signals'19874,461,402'Container liner'19844,449,279'Bag system for transportation of bulk liquids'19844,441,627'Bag system for transportation of bulk liquids'19844,221,296'Shipping assembly'19804,178,270'Method for supporting hydrous metal oxide on carrier'19794,140,695'Process for producing copper phthalocyanines'19794,133,753'Method of ion exchange chromatography'19794,073,725'Method and apparatus for liquid chromatography under elevated pressure'19784,070,284'Liquid chromatography and apparatus for the same'1978

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–2008Patents assigned to HITACHI LTD (15)· patent assignee history
1978–2008Based in Hitachiota, JP· patent location history
1980–1987Patents assigned to FELL DON LTD (5)· patent assignee history
1980–1987Based in Burlington, CA· patent location history
1984Patents assigned to FELL LAWRENCE LTD (3)· patent assignee history
1994–2021Patents assigned to CANON KK (37)· patent assignee history
1995–1999Based in Kawasaki, JP· patent location history
1996–2015Based in Utsunomiya, JP· patent location history
2004–2008Based in Tochigi, JP· patent location history
2019–2020Patents assigned to CANON USA INC (5)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK371994–2021
HITACHI LTD151978–2008
CANON USA INC52019–2020
FELL DON LTD51980–1987
FELL LAWRENCE LTD31984
Locations
LocationPatentsSpan
Utsunomiya, JP181996–2015
Tochigi, JP92004–2008
Hitachiota, JP71978–2008
Kawasaki, JP61995–1999
Burlington, CA61980–1987