Inventor
Seiko Kurio
Inventor
Hyogo, JP
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds33%
PatentTitleYear
5,407,780'Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde'19955,403,696'Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenol'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995Patents assigned to SUMITOMO CHEMICAL CO (2)· patent assignee history
1995Based in Hyogo, JP· patent location history
1995Based in Kawanishi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SUMITOMO CHEMICAL CO | 2 | 1995 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hyogo, JP | 1 | 1995 |
| Kawanishi, JP | 1 | 1995 |