Inventor

Hideo Hosoya

Inventor

Tokyo, JP

Overview

1→

Patents

1991

Patent span

Chemistry

Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

A61Kprimary

A61KPreparations for medical, dental or toiletry purposes17%

A61QSpecific use of cosmetics or similar toiletry preparations17%

C12NMicroorganisms or enzymes17%

C12PFermentation or enzyme-using processes to synthesise a desired chemical compound or composition or to separate optical isomers from a racemic mixture17%

C12RIndexing scheme associated with subclasses c12c - c12q, relating to microorganisms17%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%

PatentTitleYear

5,023,175'Novel production process of hyaluronic acid and bacterium strain therefor'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991Patents assigned to YAKULT HONSHA KK (1)· patent assignee history

1991Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
YAKULT HONSHA KK	1	1991

Locations

Location	Patents	Span
Tokyo, JP	1	1991