LexDanaLexDanabeta
Inventor

Yoichi Miyasaka

Inventor
Tokyo, JP

Overview

38→
Patents
1984–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 38 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Bprimary
H10BElectronic memory devices13%
H10DInorganic electric semiconductor devices13%
B41JTypewriters10%
G02BOptical elements, systems or apparatus7%
H05BElectric heating4%
H10KOrganic electric solid-state devices4%
Y10TTechnical subjects covered by former us classification4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
C23CCoating metallic material3%
D04HMaking textile fabrics, e.g. from fibres or filamentary material3%
PatentTitleYear
11,124,868Method of surface treatment for gear for strain wave reduction gear mechanism202111,041,245Method for preventing adhesion of aluminum202110,870,281Liquid absorber, ink absorbing device, and liquid droplet ejection apparatus202010,828,903Ink absorbing member accommodation container and ink absorbing structure202010,676,867Defibrated material manufacturing device, and sheet manufacturing apparatus202010,041,199Sheet manufacturing apparatus20189,738,996'Sheet manufacturing apparatus'20179,162,445'Liquid material discharge control method and droplet discharge device'20158,668,951'Liquid material arrangement method, color filter manufacturing method, and organic EL display device manufacturing method'20148,389,046'Liquid material arrangement method, color filter manufacturing method, and organic EL display device manufacturing method'20138,247,021'Liquid material arrangement method, color filter manufacturing method, and organic EL display device manufacturing method'20128,173,223'Method for discharging liquid material, method for manufacturing color filter, and method for manufacturing organic EL element'20128,124,190'Method for discharging liquid material, method for manufacturing color filter, and method for manufacturing organic EL element'20128,033,240'Apparatus for ejecting liquid droplet, work to be applied thereto, method of manufacturing electro-optic device, electro-optic device, and electronic equipment'20117,601,219'Apparatus for ejecting liquid droplet, work to be applied thereto, method of manufacturing electro-optic device, electro-optic device, and electronic equipment'20097,592,032'Method of recognizing image of nozzle hole and method of correcting position of liquid droplet ejection head using the same; method of inspecting nozzle hole; apparatus for recognizing image of nozzle hole and liquid droplet ejection apparatus equipped with the same; method of manufacturing electro-optical device; electro-optical device; and electronic equipment'20097,566,636'Method of scribing stuck mother substrate and method of dividing stuck mother substrate'20097,399,051'Ejection device, material coating method, method of manufacturing color filter substrate, method of manufacturing electroluminescence display device, and method of manufacturing plasma display device'20087,381,449'Method for coating material, method of manufacturing color filter substrate, method of manufacturing electroluminescence display device, method of manufacturing plasma display device, and ejection device'20086,974,754'Semiconductor device including ferroelectric capacitors and fabricating method thereof'20056,570,202'Ferroelectric integrated circuit having low sensitivity to hydrogen exposure and method for fabricating same'20036,558,463'Solution and method for forming a ferroelectric film'20036,512,256'Integrated circuit having self-aligned hydrogen barrier layer and method for fabricating same'20036,225,156'Ferroelectric integrated circuit having low sensitivity to hydrogen exposure and method for fabricating same'20016,225,656'Ferroelectric integrated circuit with protective layer incorporating oxygen and method for fabricating same'20016,225,133'Method of manufacturing thin film capacitor'20016,207,465'Method of fabricating ferroelectric integrated circuit using dry and wet etching'20016,165,802'Method of fabricating ferroelectric integrated circuit using oxygen to inhibit and repair hydrogen degradation'20006,130,103'Method for fabricating ferroelectric integrated circuits'20005,670,408'Thin film capacitor with small leakage current and method for fabricating the same'19975,539,613'Compact semiconductor device including a thin film capacitor of high reliability'19965,530,279'Thin film capacitor with small leakage current and method for fabricating the same'19965,498,561'Method of fabricating memory cell for semiconductor integrated circuit'19965,332,684'Method for fabricating thin-film capacitor with restrained leakage current at side and end portions of electrodes in a semiconductor integrated circuit device'19945,122,923'Thin-film capacitors and process for manufacturing the same'19925,084,438'Electronic device substrate using silicon semiconductor substrate'19925,053,917'Thin film capacitor and manufacturing method thereof'19914,456,850'Piezoelectric composite thin film resonator'1984

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1984–2003Based in Tokyo, JP· patent location history
1991–2003Patents assigned to NEC CORP (17)· patent assignee history
2000–2003Patents assigned to SYMETRIX CORP (7)· patent assignee history
2005Based in Kanagawa, JP· patent location history
2008–2020Patents assigned to SEIKO EPSON CORP (17)· patent assignee history
2008–2020Based in Suwa, JP· patent location history
2009–2020Based in Nagano, JP· patent location history
2012–2015Patents assigned to MIYASAKA YOICHI (6)· patent assignee history
2012–2014Patents assigned to KITAHARA TSUYOSHI (3)· patent assignee history
2021Based in Nagoya, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NEC CORP171991–2003
SEIKO EPSON CORP172008–2020
SYMETRIX CORP72000–2003
MIYASAKA YOICHIself62012–2015
KITAHARA TSUYOSHI32012–2014
Locations
LocationPatentsSpan
Tokyo, JP181984–2003
Suwa, JP92008–2020
Nagano, JP82009–2020
Nagoya, JP22021
Kanagawa, JP12005