Inventor

Johan Gertrudis Cornelis Kunnen

Inventor
Weert, NL

Overview

23→
Patents
2015–2021
Patent span
Physics
Primary field (CPC G)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices46%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
H01LSemiconductor devices16%
G01KMeasuring temperature4%
H05BElectric heating4%
Y10TTechnical subjects covered by former us classification4%
PatentTitleYear
RE048668Temperature sensing probe, burl plate, lithographic apparatus and method202110,990,025Patterning device cooling apparatus202110,747,126Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method202010,591,828Lithographic apparatus and method202010,551,752Lithographic apparatus and method202010,520,837Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method201910,324,382Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method201910,281,830Patterning device cooling systems in a lithographic apparatus201910,222,713Patterning device cooling apparatus201910,203,611Lithographic apparatus and method201910,191,377Lithographic apparatus and a device manufacturing method20199,971,252Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method20189,939,738Lithographic apparatus and an object positioning system20189,897,928'Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method'20189,823,589'Lithographic apparatus and method'20179,740,110'Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method'20179,632,435'Lithographic apparatus and method'20179,618,858'Lithographic apparatus and a device manufacturing method involving thermal conditioning of a table'20179,575,419'Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method'20179,298,107'Lithographic apparatus and method'20169,280,063'Substrate table assembly, an immersion lithographic apparatus and a device manufacturing method'20169,141,005'Temperature sensing probe, burl plate, lithographic apparatus and method'20158,970,822'Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015–2021Patents assigned to ASML NETHERLANDS BV (23)· patent assignee history
2015–2020Patents assigned to KUNNEN JOHAN GERTRUDIS CORNELIS (8)· patent assignee history
2015–2020Patents assigned to LAURENT THIBAULT SIMON MATHIEU (8)· patent assignee history
2015–2018Patents assigned to DERKS SANDER CATHARINA REINIER (4)· patent assignee history
2015–2021Based in Weert, NL· patent location history
2016–2020Patents assigned to JACOBS JOHANNES HENRICUS WILHELMUS (5)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV232015–2021
KUNNEN JOHAN GERTRUDIS CORNELISself82015–2020
LAURENT THIBAULT SIMON MATHIEU82015–2020
JACOBS JOHANNES HENRICUS WILHELMUS52016–2020
DERKS SANDER CATHARINA REINIER42015–2018
Locations
LocationPatentsSpan
Weert, NL232015–2021