Inventor
Saburo Kamiya
Inventor
Yokohama, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices54%
G01BMeasuring length, thickness or similar linear dimensions18%
B23KSoldering or unsoldering5%
B60KArrangement or mounting of propulsion units or of transmissions in vehicles3%
B60NSeats specially adapted for vehicles3%
B60TVehicle brake control systems or parts thereof3%
B60YIndexing scheme relating to aspects cross-cutting vehicle technology3%
F16DCouplings for transmitting rotation3%
F16HGearing3%
F24FAir-conditioning3%
PatentTitleYear
11,009,129Vehicle parking apparatus202110,960,800Seat frame20217,876,452'Interferometric position-measuring devices and methods'20117,471,372'Exposure apparatus and production method of device using the same'20087,283,200'System and method for measuring displacement of a stage'20076,897,963'Stage device and exposure apparatus'20056,784,972'Exposure apparatus, device manufacturing method and environmental control method of exposure apparatus'20046,741,358'Exposure apparatus and device production method in which position of reference plate provided on substrate stage is measured'20046,714,278'Exposure apparatus'20046,710,854'Projection exposure apparatus'20046,377,336'Projection exposure apparatus'20026,002,987'Methods to control the environment and exposure apparatus'19995,790,253'Method and apparatus for correcting linearity errors of a moving mirror and stage'19985,719,704'Projection exposure apparatus'19985,563,683'Substrate holder'19965,550,633'Optical measuring apparatus having a partitioning wall for dividing gas flow in an environmental chamber'19965,392,120'Dual interferometer measuring system including a wavelength correction resulting from a variation in the refractive index'19955,272,501'Projection exposure apparatus'19935,151,749'Method of and apparatus for measuring coordinate position and positioning an object'19925,018,848'Laser beam transmitting apparatus'19914,989,031'Projection exposure apparatus'19914,902,900'Device for detecting the levelling of the surface of an object'19904,853,745'Exposure apparatus'19894,820,899'Laser beam working system'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–2011Patents assigned to NIKON CORP (21)· patent assignee history
1989–2004Based in Yokohama, JP· patent location history
1999–2011Based in Tokyo, JP· patent location history
2004Patents assigned to NIPPON KOGAKU KK (1)· patent assignee history
2004–2008Based in Ageo, JP· patent location history
2021Patents assigned to HONDA MOTOR CO LTD (1)· patent assignee history
2021Patents assigned to TOYOTA BOSHOKU KK (1)· patent assignee history
2021Based in Wako, JP· patent location history
2021Based in Aichi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 21 | 1989–2011 |
| HONDA MOTOR CO LTD | 1 | 2021 |
| NIPPON KOGAKU KK | 1 | 2004 |
| TOYOTA BOSHOKU KK | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 13 | 1989–2004 |
| Ageo, JP | 3 | 2004–2008 |
| Tokyo, JP | 2 | 1999–2011 |
| Wako, JP | 1 | 2021 |
| Aichi, JP | 1 | 2021 |