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Inventor

Eiji Miyamoto

Inventor
Ohme, JP

Overview

38→
Patents
1979–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 38 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G11Cprimary
G11CStatic stores16%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1015%
H10BElectronic memory devices11%
H10DInorganic electric semiconductor devices8%
B01DSeparation7%
G11BInformation storage based on relative movement between record carrier and transducer4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry4%
F01NGas-flow silencers or exhaust apparatus for machines or engines in general4%
H02KDynamo-electric machines4%
PatentTitleYear
10,434,459Method and device for treating nitroso compound20199,399,188'Apparatus for removing carbon dioxide in combustion exhaust gas'20169,120,051'Method and device for treating exhaust gas containing carbon dioxide'20158,741,245'Carbon dioxide-absorbing solution and method of recovering carbon dioxide'20148,262,846'Plasma processing apparatus and method thereof'20127,824,635'Filter for exhaust gas from diesel engine and equipment'20107,655,064'Particulate matter-containing exhaust emission controlling filter, exhaust emission controlling method and device'20107,552,453'Disk driving apparatus'20097,499,340'Semiconductor memory device and defect remedying method thereof'20097,345,929'Semiconductor memory device and defect remedying method thereof'20087,332,039'Plasma processing apparatus and method thereof'20087,256,558'Brushless motor and disk drive device using the same'20077,203,101'Semiconductor memory device and defect remedying method thereof'20077,016,236'Semiconductor memory device and defect remedying method thereof'20066,898,130'Semiconductor memory device and defect remedying method thereof'20056,833,117'Exhaust emission control catalyst element, catalyst structure, production method thereof, exhaust emission control apparatus and exhaust emission control method using the apparatus'20046,806,601'Brushless motor and disk drive including the same'20046,710,013'Exhaust emission control catalyst structure'20046,657,901'Semiconductor device formed in a rectangle region on a semiconductor substrate including a voltage generating circuit'20036,515,913'Semiconductor memory device and defect remedying method thereof'20036,335,884'Semiconductor memory device and defect remedying method thereof'20026,256,289'Storage media driving motor with rotor magnet position determiner and balancing objects'20016,249,505'Disk drive motor'20016,212,089'Semiconductor memory device and defect remedying method thereof'20016,205,110'Disk drive motor'20016,160,744'Semiconductor memory device and defect remedying method thereof'20006,049,500'Semiconductor memory device and defect remedying method thereof'20005,854,508'Semiconductor memory device having zigzag bonding pad arrangement'19985,701,031'Sealed stacked arrangement of semiconductor devices'19975,602,771'Semiconductor memory device and defect remedying method thereof'19975,579,256'Semiconductor memory device and defect remedying method thereof'19965,422,153'Weft knitted composite fabric'19955,332,922'Multi-chip semiconductor package'19945,208,782'Semiconductor integrated circuit device having a plurality of memory blocks and a lead on chip (LOC) arrangement'19935,149,253'Magnet pumps'19924,985,869'Semiconductor memory device with an improved substrate back-bias arrangement'19914,480,517'Back-splitting apparatus for use in production of books'19844,132,138'Cutter for a cutting machine'1979

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2009Patents assigned to HITACHI LTD (15)· patent assignee history
1991–2009Based in Ohme, JP· patent location history
1993–2009Patents assigned to HITACHI VLSI ENG (6)· patent assignee history
2001–2009Patents assigned to NIDEC CORP (6)· patent assignee history
2001–2004Based in Hikone, JP· patent location history
2004–2014Patents assigned to BABCOCK HITACHI KK (5)· patent assignee history
2004–2016Based in Kure, JP· patent location history
2007–2009Based in Kyoto, JP· patent location history
2008–2012Based in Hachioji, JP· patent location history
2012–2016Patents assigned to MIYAMOTO EIJI (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD151991–2009
HITACHI VLSI ENG61993–2009
NIDEC CORP62001–2009
BABCOCK HITACHI KK52004–2014
MIYAMOTO EIJIself42012–2016
Locations
LocationPatentsSpan
Ohme, JP171991–2009
Kure, JP72004–2016
Hikone, JP42001–2004
Hachioji, JP22008–2012
Kyoto, JP22007–2009