Inventor

Markus Holz

Inventor
Aalen, DE

Overview

12→
Patents
2017–2021
Patent span
Physics
Primary field (CPC G)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
G02BOptical elements, systems or apparatus23%
B22DCasting of metals4%
B81BMicrostructural devices or systems, e.g. micromechanical devices4%
F27BFurnaces, kilns, ovens or retorts in general4%
F27DDetails or accessories of furnaces, kilns, ovens or retorts, in so far as they are of kinds occurring in more than one kind of furnace4%
G01DMeasuring not specially adapted for a specific variable4%
G21DNuclear power plant4%
G21FProtection against x-radiation, gamma radiation, corpuscular radiation or particle bombardment4%
H01LSemiconductor devices4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017–2021Patents assigned to ZEISS CARL SMT GMBH (10)· patent assignee history
2017–2020Patents assigned to ALD VACUUM TECHN GMBH (2)· patent assignee history
2017–2021Based in Aalen, DE· patent location history
2017Based in Bruchköbel, DE· patent location history
2020Based in Bruchkobel, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ZEISS CARL SMT GMBH102017–2021
ALD VACUUM TECHN GMBH22017–2020
Locations
LocationPatentsSpan
Aalen, DE102017–2021
Bruchkobel, DE12020
Bruchköbel, DE12017