Inventor
Katsuhiko Nomoto
Inventor
Kashiwara, JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material30%
H01JElectric discharge tubes or discharge lamps23%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation13%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution13%
Y02PClimate change mitigation technologies in the production or processing of goods13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
Y10TTechnical subjects covered by former us classification3%
PatentTitleYear
7,722,738'Semiconductor device manufacturing unit and semiconductor device manufacturing method'20107,565,880'Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same'20097,195,673'Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same'20077,032,536'Thin film formation apparatus including engagement members for support during thermal expansion'2006RE039064'Electronic device manufacturing apparatus and method for manufacturing electronic device'20066,979,589'Silicon-based thin-film photoelectric conversion device and method of manufacturing thereof'20056,242,686'Photovoltaic device and process for producing the same'20016,142,096'Electronic device manufacturing apparatus and method for manufacturing electronic device'20006,009,828'Method for forming a thin semiconductor film and a plasma CVD apparatus to be used in the method'20005,618,758'Method for forming a thin semiconductor film and a plasma CVD apparatus to be used in the method'19975,487,786'Plasma chemical vapor deposition device capable of suppressing generation of polysilane powder'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2010Patents assigned to SHARP KK (11)· patent assignee history
1996–2010Based in Kashiwara, JP· patent location history
2001Based in Kashihara, JP· patent location history
2007–2009Based in Osaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHARP KK | 11 | 1996–2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kashiwara, JP | 8 | 1996–2010 |
| Osaka, JP | 2 | 2007–2009 |
| Kashihara, JP | 1 | 2001 |