Inventor
Yasuhiro Koizumi
Inventor
Sayama, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%
H01JElectric discharge tubes or discharge lamps31%
G01NInvestigating or analysing materials by determining their chemical or physical properties12%
C23CCoating metallic material8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
A23BPreservation of foods, foodstuffs or non-alcoholic beverages4%
A23LFoods, foodstuffs or non-alcoholic beverages, not otherwise provided for4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
PatentTitleYear
7,252,910'Fabrication method of semiconductor integrated circuit device and mask fabrication method'20076,879,393'Defect inspection apparatus for phase shift mask'20056,863,018'Ion plating device and ion plating method'20056,841,399'Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device'20056,831,413'Plasma display panel'20046,816,134'Plasma display panel'20046,579,428'Arc evaporator, method for driving arc evaporator, and ion plating apparatus'20036,476,387'Method and apparatus for observing or processing and analyzing using a charged beam'20026,303,932'Method and its apparatus for detecting a secondary electron beam image and a method and its apparatus for processing by using focused charged particle beam'20015,786,112'Photomask manufacturing process and semiconductor integrated circuit device manufacturing process using the photomask'19985,447,614'Method of processing a sample using a charged beam and reactive gases and system employing the same'19955,439,763'Optical mask and method of correcting the same'19955,358,806'Phase shift mask, method of correcting the same and apparatus for carrying out the method'19945,342,448'Apparatus for processing a sample using a charged beam and reactive gases'19944,704,348'Exposure of uniform fine pattern on photoresist'19874,609,566'Method and apparatus for repairing defects on a photo-mask pattern'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1986–2004Patents assigned to HITACHI LTD (11)· patent assignee history
1986–2007Based in Sayama, JP· patent location history
2003–2005Patents assigned to SHINMAYWA IND LTD (2)· patent assignee history
2003Patents assigned to CITIZEN WATCH CO LTD (1)· patent assignee history
2003–2004Based in Nishinomiya, JP· patent location history
2005–2007Patents assigned to DAINIPPON PRINTING CO LTD (3)· patent assignee history
2005Patents assigned to RENESAS TECH CORP (1)· patent assignee history
2005Based in Tokyo, JP· patent location history
2005Based in Hyogo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 11 | 1986–2004 |
| DAINIPPON PRINTING CO LTD | 3 | 2005–2007 |
| SHINMAYWA IND LTD | 2 | 2003–2005 |
| CITIZEN WATCH CO LTD | 1 | 2003 |
| RENESAS TECH CORP | 1 | 2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sayama, JP | 10 | 1986–2007 |
| Nishinomiya, JP | 3 | 2003–2004 |
| Tokyo, JP | 2 | 2005 |
| Hyogo, JP | 1 | 2005 |