Inventor
Tadashi Saga
Inventor
Tokyo, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices47%
Y10TTechnical subjects covered by former us classification30%
C23FNon-mechanical removal of metallic material from surface10%
A44BButtons, pins, buckles, slide fasteners, or the like3%
A61FFilters implantable into blood vessels3%
C03CChemical composition of glasses, glazes or vitreous enamels3%
C23CCoating metallic material3%
PatentTitleYear
8,012,654'Photomask blank and photomask'20118,007,964'Photomask blank and photomask'20118,003,284'Photomask blank and photomask'20117,989,124'Photomask blank and photomask making method'20117,790,339'Photomask blank'20107,771,893'Photomask blank, photomask and fabrication method thereof'20107,767,366'Photomask blank and photomask'20107,767,367'Photomask blank and photomask making method'20107,691,546'Photomask blank and photomask'20107,625,677'Half-tone stacked film, photomask-blank, photomask and fabrication method thereof'20097,618,753'Photomask blank, photomask and method for producing those'20097,598,004'Film-depositing target and preparation of phase shift mask blank'20097,556,892'Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method'20097,351,505'Phase shift mask blank, phase shift mask, and pattern transfer method'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2011Patents assigned to SHINETSU CHEMICAL CO (14)· patent assignee history
2008–2011Patents assigned to TOPPAN PRINTING CO LTD (14)· patent assignee history
2008–2011Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 14 | 2008–2011 |
| TOPPAN PRINTING CO LTD | 14 | 2008–2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 14 | 2008–2011 |