Inventor
Dieter Pierreux
Inventor
Dilbeek, BE
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
H01LSemiconductor devices27%
C23CCoating metallic material14%
H10DInorganic electric semiconductor devices10%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
C23FNon-mechanical removal of metallic material from surface6%
H01JElectric discharge tubes or discharge lamps3%
C01BNon-metallic elements1%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation1%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution1%
PatentTitleYear
11,107,676Method and apparatus for filling a gap202111,088,002Substrate rack and a substrate processing system and method202111,056,353Method and structure for wet etch utilizing etch protection layer comprising boron and carbon202110,741,385Method and apparatus for filling a gap202010,699,899Atomic layer deposition of antimony oxide films202010,513,772Process for passivating dielectric films201910,460,932Semiconductor device with amorphous silicon filled gaps and methods for forming201910,453,685Forming semiconductor device by providing an amorphous silicon core with a hard mask layer201910,343,907Method and system for delivering hydrogen peroxide to a semiconductor processing chamber201910,199,223Semiconductor device fabrication using etch stop layer201910,056,249Atomic layer deposition of antimony oxide films20189,916,980'Method of forming a structure on a substrate'20189,887,082'Method and apparatus for filling a gap'20189,837,281Cyclic doped aluminum nitride deposition20179,812,320'Method and apparatus for filling a gap'20179,799,509'Cyclic aluminum oxynitride deposition'20179,711,351'Process for densifying nitride film'20179,576,790'Deposition of boron and carbon containing materials'20179,552,979'Cyclic aluminum nitride deposition in a batch reactor'20179,514,934'Atomic layer deposition of antimony oxide films'20169,431,238'Reactive curing process for semiconductor substrates'20169,006,112'Atomic layer deposition of antimony oxide films'20158,633,050'Solar cell, and method of manufacturing the same'20148,399,344'Method for adjusting the threshold voltage of a gate stack of a PMOS device'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2015Patents assigned to ASM INT (3)· patent assignee history
2013–2019Patents assigned to PIERREUX DIETER (3)· patent assignee history
2013–2019Patents assigned to MACHKAOUTSAN VLADIMIR (2)· patent assignee history
2013–2014Based in Almere, NL· patent location history
2015–2021Based in Dilbeek, BE· patent location history
2016–2021Patents assigned to ASM IP HOLDING BV (17)· patent assignee history
2016–2020Patents assigned to ASM INT NV (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASM IP HOLDING BV | 17 | 2016–2021 |
| ASM INT NV | 4 | 2016–2020 |
| ASM INT | 3 | 2013–2015 |
| PIERREUX DIETERself | 3 | 2013–2019 |
| MACHKAOUTSAN VLADIMIR | 2 | 2013–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Dilbeek, BE | 22 | 2015–2021 |
| Almere, NL | 2 | 2013–2014 |