Inventor

Nobutoshi Mizusawa

Inventor
Yamato, JP

Overview

43→
Patents
1987–2000
Patent span
Physics
Primary field (CPC G)

Patents· 43 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
B41JTypewriters11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
G21KHandling of particles or ionising radiation not otherwise provided for8%
G03GElectrography6%
H01JElectric discharge tubes or discharge lamps6%
H04NPictorial communication, e.g. television5%
Y10TTechnical subjects covered by former us classification5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
G02BOptical elements, systems or apparatus2%
PatentTitleYear
6,167,111'Exposure apparatus for synchrotron radiation lithography'20005,999,589'Substrate holding device and exposing apparatus using the same'19995,883,932'Substrate holding device and exposing apparatus using the same'19995,854,819'Mask supporting device and correction method therefor, and exposure apparatus and device producing method utilizing the same'19985,825,463'Mask and mask supporting mechanism'19985,822,389'Alignment apparatus and SOR X-ray exposure apparatus having same'19985,760,802'Recording apparatus and ink cartridge'19985,641,264'Substrate conveying device and method of controlling the same'19975,577,552'Temperature controlling device for mask and wafer holders'19965,552,812'Recording apparatus having an ink mist evacuation system'19965,524,131'Alignment apparatus and SOR x-ray exposure apparatus having same'19965,498,501'Exposure method'19965,485,495'X-ray mask, and exposure apparatus and device production using the mask'19965,467,114'Recording apparatus and ink cartridge'19955,390,227'Exposure apparatus'19955,377,251'Exposure apparatus'19945,365,561'Exposure control in an X-ray exposure apparatus'19945,356,686'X-ray mask structure'19945,317,615'Exposure apparatus'19945,285,488'Exposure apparatus'19945,277,539'Substrate conveying apparatus'19945,267,292'X-ray exposure apparatus'19935,182,615'Exposure apparatus'19935,172,402'Exposure apparatus'19925,172,403'X-ray exposure apparatus'19925,168,512'Method of manufacture of semiconductor devices'19925,160,961'Substrate holding device'19925,159,621'X-ray transmitting window and method of mounting the same'19925,157,700'Exposure apparatus for controlling intensity of exposure radiation'19925,150,391'Exposure apparatus'19925,140,429'Ink-jet recording apparatus with mechanism for automatically regulating a recording head'19925,026,239'Mask cassette and mask cassette loading device'19914,999,506'Positioning mechanism'19914,977,459'Ink-jet recording apparatus with mechanism for automatically regulating a recording head'19904,947,190'Ink jet recording apparatus comprising mechanism for conveying sheet-like cleaning medium to a recording region, discharge recovery treatment method employed in the same, and cleaning sheet also employed in the same'19904,906,833'Electron beam information exchange apparatus with converting light signals'19904,906,894'Photoelectron beam converting device and method of driving the same'19904,893,137'Recording apparatus and ink cartridge'19904,798,694'Method for producing composite materials'19894,757,331'Recorder having ink supply means for movable ink tank'19884,685,766'Optical device'19874,677,448'Recording apparatus with a carriage-mounted ink tank and overflow tank'19874,640,592'Optical display utilizing thermally formed bubble in a liquid core waveguide'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987–2000Patents assigned to CANON KK (42)· patent assignee history
1987Patents assigned to CANON KABUSHIIKI KAISHA (1)· patent assignee history
1987Based in Yokohama, JP· patent location history
1988Based in Tokyo, JP· patent location history
1989–1990Based in Sagamihara, JP· patent location history
1990–2000Based in Yamato, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK421987–2000
CANON KABUSHIIKI KAISHA11987
Locations
LocationPatentsSpan
Yamato, JP351990–2000
Sagamihara, JP41989–1990
Yokohama, JP31987
Tokyo, JP11988