Inventor
Min-Ja Yoo
Inventor
Boryeong-si, KR
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Dprimary
C07DHeterocyclic compounds23%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests23%
C07CAcyclic or carbocyclic compounds15%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%
PatentTitleYear
8,043,789'Photosensitive compound and photoresist composition including the same'20117,947,423'Photosensitive compound and photoresist composition including the same'20117,935,474'Acid-amplifier having acetal group and photoresist composition including the same'20116,787,621'Vinyl group-containing diarylethene and polymer thereof having excellent optical properties'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004Patents assigned to KOREA RES INST CHEM TECH (1)· patent assignee history
2004Based in Kumi-shi, KR· patent location history
2011Patents assigned to DONGJIN SEMICHEM CO LTD (3)· patent assignee history
2011Based in Boryeong-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DONGJIN SEMICHEM CO LTD | 3 | 2011 |
| KOREA RES INST CHEM TECH | 1 | 2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boryeong-si, KR | 3 | 2011 |
| Kumi-shi, KR | 1 | 2004 |