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Inventor

Yueh-Hsun Li

Inventor
Kaohsiung, TW

Overview

4→
Patents
2014–2018
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
C23CCoating metallic material20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
10,061,193Focused radiation beam induced deposition20189,915,866'Focused radiation beam induced deposition'20189,910,350'Method for repairing a mask'20188,921,015'Mask repair with passivation'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014Patents assigned to TAIWAN SEMICONDUCTOR MFG (1)· patent assignee history
2014–2018Based in Kaohsiung, TW· patent location history
2018Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD32018
TAIWAN SEMICONDUCTOR MFG12014
Locations
LocationPatentsSpan
Kaohsiung, TW42014–2018