Inventor
Philippe Laporte
Inventor
Sassenage, FR
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
Y10Sprimary
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests29%
C23CCoating metallic material14%
H01JElectric discharge tubes or discharge lamps14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
Y10TTechnical subjects covered by former us classification14%
PatentTitleYear
6,077,383'Device for separating wafers and process for using said device'20005,354,711'Process for etching and depositing integrated circuit interconnections and contacts'19944,491,496'Enclosure for the treatment, and particularly for the etching of substrates by the reactive plasma method'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–1994Patents assigned to COMMISSARIAT ENERGIE ATOMIQUE (2)· patent assignee history
1985Based in Echirolles, FR· patent location history
1994–2000Based in Sassenage, FR· patent location history
2000Patents assigned to COMMISSARIAT A L EN (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| COMMISSARIAT ENERGIE ATOMIQUE | 2 | 1985–1994 |
| COMMISSARIAT A L EN | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sassenage, FR | 2 | 1994–2000 |
| Echirolles, FR | 1 | 1985 |