Inventor

Masayuki Kouketsu

Inventor
Komaki, JP

Overview

29→
Patents
2000–2021
Patent span
Performing operations
Primary field (CPC B)

Patents· 29 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

F16Kprimary
F16KValves16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
Y10TTechnical subjects covered by former us classification11%
B01DSeparation7%
B01BBoiling6%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry6%
G05DSystems for controlling or regulating non-electric variables6%
H01FMagnets6%
B05BSpraying apparatus3%
B05CApparatus for applying fluent materials to surfaces, in general3%
PatentTitleYear
10,907,748Flow path switching valve and manufacturing method therefor202110,832,853Coil and coil production method202010,344,887Electromagnetic actuator201910,121,590Coil sheet production method, and coil production method201810,043,609Cooling structure for electromagnetic coil, and electromagnetic actuator20189,508,476'Electromagnetic coil, method of manufacturing electromagnetic coil, and electromagnetic actuator'20169,266,130'Liquid control apparatus'20169,243,720'Coupling apparatus for chemical fluid flow channel'20169,234,586'Linear actuator and vacuum control device'20169,234,595'Vacuum control valve and vacuum control apparatus'2016D0742494'Vaporization device for a vaporization unit of a liquid control apparatus'2015D0742493'Vaporization device for a vaporization unit of a liquid control apparatus'20159,127,359'Liquid vaporizer'2015D0736901'Vaporization device for a vaporization unit of a liquid control apparatus'20159,031,391'Woven mesh form liquid control apparatus'20159,022,366'Liquid control device and mesh-like body assembly applied thereto'20159,010,736'Liquid control apparatus'20158,840,049'Liquid ejecting apparatus'20148,590,942'Connected structure of vacuum double pipe, vacuum double pipe, and joint of vacuum double pipe'20138,573,560'Vacuum control valve and vacuum control system'20138,544,500'Coupling apparatus for chemical fluid flow channel'20138,544,350'Sample injector'20138,361,231'Liquid vaporization system'20138,210,196'Vacuum control system and vacuum control method'20126,913,031'Pulse shot type flow controller and pulse shot type flow controlling method'20056,508,268'Vacuum pressure control apparatus'20036,289,737'Vacuum pressure control system'20016,202,681'Vacuum pressure control system'20016,041,814'Vacuum pressure control system'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2021Patents assigned to CKD CORP (29)· patent assignee history
2000–2021Based in Komaki, JP· patent location history
2001–2015Based in Tokyo, JP· patent location history
2005Based in Kasugai, JP· patent location history
2012–2014Patents assigned to ITAFUJI HIROSHI (7)· patent assignee history
2012–2014Patents assigned to KOUKETSU MASAYUKI (7)· patent assignee history
2013Patents assigned to HAYAKAWA SHINJI (1)· patent assignee history
2015Patents assigned to CDK CORP (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CKD CORP292000–2021
ITAFUJI HIROSHI72012–2014
KOUKETSU MASAYUKIself72012–2014
CDK CORP12015
HAYAKAWA SHINJI12013
Locations
LocationPatentsSpan
Komaki, JP232000–2021
Tokyo, JP52001–2015
Kasugai, JP12005