Inventor
Kensuke Saisyo
Inventor
Kawasaki, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests30%
C07CAcyclic or carbocyclic compounds20%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds20%
PatentTitleYear
7,972,762'Positive resist composition and method of forming resist pattern'20117,879,527'Method of producing positive resist composition, positive resist composition, and method of forming resist pattern'20117,695,889'Copolymer for semiconductor lithography and process for production thereof'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010Patents assigned to MARUZEN PETROCHEM CO LTD (1)· patent assignee history
2010Based in Kanagawa, JP· patent location history
2011Patents assigned to TOKYO OHKA KOGYO CO LTD (2)· patent assignee history
2011Based in Kawasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 2 | 2011 |
| MARUZEN PETROCHEM CO LTD | 1 | 2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 2 | 2011 |
| Kanagawa, JP | 1 | 2010 |