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Inventor

Harald Herchen

Inventor
Los Altos, CA, US

Overview

64→
Patents
1997–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 64 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy8%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution8%
Y02PClimate change mitigation technologies in the production or processing of goods7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
H01JElectric discharge tubes or discharge lamps6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification6%
C23CCoating metallic material5%
G05BControl or regulating systems in general5%
PatentTitleYear
10,962,492Method of measurement and estimation of the coefficient of thermal expansion in components202110,873,092Fuel cell interconnect with reduced voltage degradation and manufacturing method202010,593,962Pre-formed powder delivery to powder press machine202010,505,206Coatings for SOFC metallic interconnects201910,333,162Methods and systems for detecting leaks in a fuel cell stack201910,079,393Method of fabricating an interconnect for a fuel cell stack20189,993,874Composition and processing of metallic interconnects for SOFC stacks20189,958,406Method of measurement and estimation of the coefficient of thermal expansion in components20189,847,520Thermal processing of interconnects20179,678,501'Serialization of fuel cell components'20179,570,769'Fuel cell interconnect'20179,502,721'Pre-formed powder delivery to powder press machine'20169,468,736'Fuel cell interconnect with reduced voltage degradation over time'20169,452,475'Coatings for SOFC metallic interconnects'20169,196,909'Fuel cell interconnect heat treatment method'20158,962,219'Fuel cell interconnects and methods of fabrication'20158,802,331'Non-destructive testing methods for fuel cell interconnect manufacturing'20148,785,821'Substrate processing apparatus with heater element held by vacuum'20148,550,031'Cluster tool architecture for processing a substrate'20138,215,262'Cluster tool architecture for processing a substrate'20128,181,596'Cluster tool architecture for processing a substrate'20128,146,530'Cluster tool architecture for processing a substrate'20127,925,377'Cluster tool architecture for processing a substrate'20117,831,135'Method and system for controlling bake plate temperature in a semiconductor processing chamber'20107,743,728'Cluster tool architecture for processing a substrate'20107,694,647'Cluster tool architecture for processing a substrate'20107,567,885'Method and system for determining object height'20097,521,915'Wafer bevel particle detection'20097,517,469'Method and system to measure flow velocity and volume'20097,500,781'Method and apparatus for detecting substrate temperature in a track lithography tool'20097,497,026'Method and system for detection of wafer centering in a track lithography tool'20097,371,022'Developer endpoint detection in a track lithography system'20087,357,842'Cluster tool architecture for processing a substrate'20087,285,195'Electric field reducing thrust plate'20077,138,039'Liquid isolation of contact rings'20067,087,144'Contact ring with embedded flexible contacts'20067,067,045'Method and apparatus for sealing electrical contacts during an electrochemical deposition process'20067,025,862'Plating uniformity control by contact ring shaping'20066,875,331'Anode isolation by diffusion differentials'20056,869,516'Method for removing electrolyte from electrical contacts and wafer touching areas'20056,855,235'Anode impedance control through electrolyte flow control'20056,843,897'Anode slime reduction method while maintaining low current'20056,692,903'Substrate cleaning apparatus and method'20046,592,673'Apparatus and method for detecting a presence or position of a substrate'20036,529,362'Monocrystalline ceramic electrostatic chuck'20036,502,529'Chamber having improved gas energizer and method'20036,444,040'Gas distribution plate'20026,369,493'Microwave plasma applicator having a thermal transfer medium between a plasma containing tube and a cooling jacket'20026,264,852'Substrate process chamber and processing method'20016,248,206'Apparatus for sidewall profile control during an etch process'20016,159,297'Semiconductor process chamber and processing method'20006,088,213'Bipolar electrostatic chuck and method of making same'20006,072,685'Electrostatic chuck having an electrical connector with housing'20006,062,237'Polymer removal from top surfaces and sidewalls of a semiconductor wafer'20006,015,761'Microwave-activated etching of dielectric layers'20005,948,168'Distributed microwave plasma reactor for semiconductor processing'19995,870,271'Pressure actuated sealing diaphragm for chucks'19995,819,434'Etch enhancement using an improved gas distribution plate'19985,789,322'Low volume gas distribution assembly for a chemical downstream etch tool'19985,780,359'Polymer removal from top surfaces and sidewalls of a semiconductor wafer'19985,747,917'Double-walled mircrowave plasma based applicator'19985,737,178'Monocrystalline ceramic coating having integral bonding interconnects for electrostatic chucks'19985,728,260'Low volume gas distribution assembly and method for a chemical downstream etch tool'19985,702,530'Distributed microwave plasma reactor for semiconductor processing'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2013Patents assigned to APPLIED MATERIALS INC (38)· patent assignee history
1997–2000Based in Fremont, CA, US· patent location history
1998–2003Based in San Jose, CA, US· patent location history
2004–2021Based in Los Altos, CA, US· patent location history
2008–2014Patents assigned to SOKUDO CO LTD (9)· patent assignee history
2012–2014Patents assigned to HERCHEN HARALD (6)· patent assignee history
2012–2013Patents assigned to ARMER HELEN R (4)· patent assignee history
2014–2021Patents assigned to BLOOM ENERGY CORP (17)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC381997–2013
BLOOM ENERGY CORP172014–2021
SOKUDO CO LTD92008–2014
HERCHEN HARALDself62012–2014
ARMER HELEN R42012–2013
Locations
LocationPatentsSpan
Los Altos, California, US432004–2021
San Jose, California, US131998–2003
Fremont, California, US81997–2000