Inventor

Ude Scheunemann

Inventor

Liederbach, DE

Overview

19→

Patents

1990–1999

Patent span

Performing operations

Primary field (CPC B)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary

B82YSpecific uses or applications of nanostructures18%

Y10TTechnical subjects covered by former us classification15%

B05DProcesses for applying fluent materials to surfaces, in general13%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein8%

C04BLime, magnesia5%

C07CAcyclic or carbocyclic compounds5%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%

B01DSeparation3%

C03CChemical composition of glasses, glazes or vitreous enamels3%

PatentTitleYear

5,948,314'Composition containing an aerogel, method of producing said composition and the use thereof'1999 5,733,663'Composite membrane and process for its production'1998 5,684,165'Substituted thieno›3,2b!thiophenes and their use'1997 5,658,669'Composite membranes and processes for their production'1997 5,517,350'Optical component based on Langmuir-Blodgett layers'1996 5,483,614'Optical waveguide moldings made from silicon nitride and a method of detecting optical wavelengths using same'1996 5,432,286'Substituted thieno[3,2-b]thiophenes and their use'1995 5,429,842'Process and device for producing ultrathin layers and layer element'1995 5,402,262'Layer element having a plurality of monomolecular layers'1995 5,358,746'Optical moldings made from silicon nitride, and a process for their production'1994 5,258,262'Radiation-sensitive film composed of at least one mono-molecular layer of fluorine-containing amphiphiles'1993 5,256,749'Amphiphilic polymers containing silane units and film comprising at least one monomolecular layer produced therefrom'1993 5,166,307'Polyamide and film made from at least one monomolecular layer of a polyamide'1992 5,137,799'Electrically conductive resist material, a process for its preparation and its use'1992 5,120,809'Amphiphilic monomers with mixed-chain structure and polymers and film composed of at least one monomolecular layer thereof'1992 5,116,925'Amphiphilic monomers and polymers and film comprising at least one unimolecular layer thereof'1992 5,081,212'Polyurea and film composed of at least one monomolecular layer of a polyurea'1992 5,034,277'Film comprising at least one unimolecular layer'1991 4,960,635'Film consisting of one or more monomolecular layers'1990

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1990–1999Patents assigned to HOECHST AG (19)· patent assignee history

1990–1992Based in Frankfurt am Main, DE· patent location history

1992–1999Based in Liederbach, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HOECHST AG	19	1990–1999

Locations

Location	Patents	Span
Liederbach, DE	15	1992–1999
Frankfurt am Main, DE	4	1990–1992