Inventor
SU-HORNG LIN
Inventor
TW
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C23CCoating metallic material8%
C30BSingle-crystal growth8%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
H01JElectric discharge tubes or discharge lamps8%
Y10TTechnical subjects covered by former us classification8%
F24FAir-conditioning4%
H05BElectric heating4%
PatentTitleYear
12,400,915Metrology method202512,359,318Mechanisms for supplying process gas into wafer process apparatus202511,854,851Interface tool202311,652,007Metrology method202311,443,959Semiconductor manufacturing system and control method202211,414,759Mechanisms for supplying process gas into wafer process apparatus2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (6)· patent assignee history
2022–2025Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 6 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 6 | 2022–2025 |