Inventor
Hirofumi Seo
Inventor
Tokyo, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1044%
C02FTreatment of water, waste water, sewage, or sludge31%
B01DSeparation6%
B03CMagnetic or electrostatic separation of solid materials from solid materials or fluids6%
F25BRefrigeration machines, plants or systems6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
PatentTitleYear
6,843,069'Etching apparatus'20056,225,233'Semiconductor device manufacturing machine and method for manufacturing a semiconductor device by using THE same manufacturing machine'20016,044,534'Semiconductor device manufacturing machine and method for manufacturing a semiconductor device by using the same manufacturing machine'20005,762,779'Method for producing electrolyzed water'19985,736,024'Method for removing heavy metal ions dissolved in a solution'19985,599,438'Method for producing electrolyzed water'19975,549,798'Wet processing apparatus having individual reactivating feedback paths for anode and cathode water'19965,543,030'Method for producing electrolyzed water'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2001Patents assigned to NEC CORP (7)· patent assignee history
1996–2001Based in Tokyo, JP· patent location history
2005Patents assigned to NEC ELECTRONICS CORP (1)· patent assignee history
2005Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NEC CORP | 7 | 1996–2001 |
| NEC ELECTRONICS CORP | 1 | 2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 7 | 1996–2001 |
| Kanagawa, JP | 1 | 2005 |