Inventor
Revathi Iyengar
Inventor
Pelham Manor, NY, US
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Dprimary
C07DHeterocyclic compounds17%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients14%
B41MPrinting, duplicating, marking, or copying processes8%
C07CAcyclic or carbocyclic compounds8%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form6%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
C09JAdhesives6%
E04BGeneral building constructions6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
PatentTitleYear
6,924,171'Bilayer wafer-level underfill'20056,515,051'Benzotriazole UV absorbers having enhanced durability'20036,506,898'Process for the preparation of 1,3,5-triazine carbamates from amino-1,3,5-triazines and organic carbonates'20036,458,872'Benzotriazole UV absorbers having enhanced durability'20026,288,226'1,3,5-Triazine carbamates from amino-1,3,5-triazines and organic carbonates and curable compositions thereof'20016,268,415'Stabilized adhesive compositions containing highly soluble, photostable benzotriazole UV absorbers and laminated articles derived therefrom'20016,262,151'Benzotriazole UV absorbers having enhanced durability'20016,225,384'Stabilized adhesive compositions containing highly soluble, high extinction, photostable hydroxyphenyl-s-trianzine UV absorbers and laminated articles derived therefrom'20016,191,199'Stabilized adhesive compositions containing highly soluble, high extinction photostable hydroxyphenyl-s-triazine UV absorbers and laminated articles derived therefrom'20016,187,845'Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom'20016,166,218'Benzotriazole UV absorbers having enhanced durability'20006,063,922'Carbamate functional 1,3,5-triazines'20005,977,219'Benzotriazole UV absorbers having enhanced durability'19995,849,821'Tris-aryl-s-triazines substituted with biphenylyl groups'19985,792,866'Process for the preparation of 1,3,5-triazine carbamates from amino 1,3,5-triazines and organic carbonates'19985,726,309'Tris-aryls-triazines substituted with biphenylyl groups'19985,705,641'Process for the preparation of 1,3,5-triazine carbamates from amino-1,3,5-triazines and organic carbonates'19985,563,273'Covalent compound having a radical-cationic moiety covalently linked to a radical anionicmoiety'19965,179,467'Charge transfer salts and uses thereof'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2005Patents assigned to IBM (3)· patent assignee history
1993–2003Based in Peekskill, NY, US· patent location history
1998–2003Patents assigned to CIBA SC HOLDING AG (10)· patent assignee history
1998–2003Patents assigned to CYTEC TECH CORP (5)· patent assignee history
1998–1999Based in Cortland, NY, US· patent location history
2000–2003Based in Pelham Manor, NY, US· patent location history
2001Patents assigned to CIBA SPECIATLY CHEMICALS CORP (1)· patent assignee history
2001–2005Based in Cortlandt Manor, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CIBA SC HOLDING AG | 10 | 1998–2003 |
| CYTEC TECH CORP | 5 | 1998–2003 |
| IBM | 3 | 1993–2005 |
| CIBA SPECIATLY CHEMICALS CORP | 1 | 2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Pelham Manor, New York, US | 7 | 2000–2003 |
| Peekskill, New York, US | 7 | 1993–2003 |
| Cortland, New York, US | 3 | 1998–1999 |
| Cortlandt Manor, New York, US | 2 | 2001–2005 |