Inventor
Koen Gerhardus Winkels
Inventor
Eindhoven, NL
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
H05GX-ray technique40%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems20%
PatentTitleYear
10,904,994Supply system for an extreme ultraviolet light source202110,499,485Supply system for an extreme ultraviolet light source201910,481,498Droplet generator for lithographic apparatus, EUV source and lithographic apparatus20199,442,380'Method and apparatus for generating radiation'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2021Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2016–2021Based in Eindhoven, NL· patent location history
2019Based in 's-Hertogenbosch, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 4 | 2016–2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 3 | 2016–2021 |
| 's-Hertogenbosch, NL | 1 | 2019 |