Inventor
Tohru Komatsu
Inventor
Yokosuka, JP
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B22Fprimary
B22FWorking metallic powder25%
C22CAlloys25%
C23CCoating metallic material25%
H01JElectric discharge tubes or discharge lamps25%
PatentTitleYear
6,352,628'Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device'20026,309,593'Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor device'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2002Patents assigned to TOSHIBA KK (2)· patent assignee history
2001–2002Based in Yokosuka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 2 | 2001–2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokosuka, JP | 2 | 2001–2002 |