Inventor
Shinichi Sumida
Inventor
Kawagoe, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds23%
C07CAcyclic or carbocyclic compounds13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
C07DHeterocyclic compounds6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
Y10TTechnical subjects covered by former us classification6%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium2%
C09JAdhesives2%
PatentTitleYear
9,678,425'Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation'20179,678,426'Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation'20179,650,451'Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions'20178,716,385'Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation'20148,691,491'Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions'20148,592,508'Top coat composition'20138,115,036'Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern'20127,947,422'Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions'20117,781,602'Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same'20107,736,835'Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern'20107,402,626'Top coat composition'20087,232,917'Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation'20077,125,943'Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions'20067,122,292'Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same'20067,105,618'Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same'20066,943,271'Process for producing fluorine-containing, polymerizable styrene monomer and intermediates used in same'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2017Patents assigned to CENTRAL GLASS CO LTD (16)· patent assignee history
2005–2017Based in Saitama, JP· patent location history
2007–2017Based in Kawagoe, JP· patent location history
2012–2014Patents assigned to KOMORIYA HARUHIKO (4)· patent assignee history
2012–2014Patents assigned to SUMIDA SHINICHI (4)· patent assignee history
2013–2014Patents assigned to INOMIYA KENJIN (2)· patent assignee history
2013–2014Patents assigned to KANTO YUSUKE (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CENTRAL GLASS CO LTD | 16 | 2005–2017 |
| KOMORIYA HARUHIKO | 4 | 2012–2014 |
| SUMIDA SHINICHIself | 4 | 2012–2014 |
| INOMIYA KENJIN | 2 | 2013–2014 |
| KANTO YUSUKE | 2 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawagoe, JP | 8 | 2007–2017 |
| Saitama, JP | 8 | 2005–2017 |