Inventor
Ronald Hoyer
Inventor
Dresden, DE
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1055%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
A61HPhysical therapy apparatus, e.g. devices for locating or stimulating reflex points in the body9%
H10BElectronic memory devices9%
H10DInorganic electric semiconductor devices9%
PatentTitleYear
7,008,853'Method and system for fabricating free-standing nanostructures'20066,564,469'Device for performing surface treatment on semiconductor wafers'20035,981,302'Integrated multi-layer test pads and methods therefor'19995,932,493'Method to minimize watermarks on silicon substrates'19995,917,197'Integrated multi-layer test pads'19995,899,701'Method for making silica strain test structures'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999Patents assigned to IBM (4)· patent assignee history
1999Patents assigned to SIEMENS AG (3)· patent assignee history
1999–2006Based in Dresden, DE· patent location history
1999Based in Poughkeepsie, NY, US· patent location history
2003–2006Patents assigned to INFINEON TECHNOLOGIES AG (2)· patent assignee history
2003Patents assigned to MOTOROLA INC (1)· patent assignee history
2003Patents assigned to SEMICONDUCTOR 300 GMBH & CO KG (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 4 | 1999 |
| SIEMENS AG | 3 | 1999 |
| INFINEON TECHNOLOGIES AG | 2 | 2003–2006 |
| MOTOROLA INC | 1 | 2003 |
| SEMICONDUCTOR 300 GMBH & CO KG | 1 | 2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Dresden, DE | 3 | 1999–2006 |
| Poughkeepsie, New York, US | 3 | 1999 |