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Inventor

Masayuki Takeda

Inventor
Kanagawa, JP

Overview

50→
Patents
1988–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 50 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Gprimary
H01GCapacitors18%
G03GElectrography14%
H10DInorganic electric semiconductor devices8%
Y10TTechnical subjects covered by former us classification8%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
G11BInformation storage based on relative movement between record carrier and transducer4%
H01HElectric switches4%
H01LSemiconductor devices4%
PatentTitleYear
9,608,083'Semiconductor device'20179,324,808'Semiconductor device, power-supply unit, amplifier and method of manufacturing semiconductor device'20169,165,851'Semiconductor device, method for manufacturing the same, power supply apparatus and high-frequency amplification unit'20158,866,157'Semiconductor device and method of fabricating the semiconductor device'20148,815,017'Method of manufacturing semiconductor device and method of cleaning semiconductor substrate'20148,637,409'Etching method, method for manufacturing semiconductor device, and etching device'20148,487,384'Semiconductor device, power-supply unit, amplifier and method of manufacturing semiconductor device'20137,998,360'Electrolysis solution for electrolytic capacitor, and electrolytic capacitor'20117,724,501'Electrolytic capacitor'20107,492,572'Electrolytic capacitor manufacturing method'20097,460,357'Electrolyte for electrolytic capacitor and electrolytic capacitor using the same'20087,456,103'Etch-resistant film, forming method thereof, surface-modified resist pattern, forming method thereof, semiconductor device and manufacturing method thereof'20087,436,651'Electric double layer capacitor and electrolytic solution therefor'20087,430,108'Electrolyte for electrolytic capacitor and electrolytic capacitor containing the same'20087,430,688'Network monitoring method and apparatus'20087,397,651'Electrolyte for electrolytic capacitor, electrolytic capacitor and process for producing tetrafluoroaluminate salt of organic onium'20087,391,603'Electric double layer capacitor and electrolytic solution therefor'20087,335,701'Magnetic disk drive having a surface coating on a magnetic disk'20087,295,424'Electrolyte for electrolytic capacitor, electrolytic capacitor and process for producing tetrafluoroaluminate salt of organic onium'20077,262,953'Electrolytic capacitor'20077,256,983'Electrolytic capacitor'20077,244,368'Manufacturing process of a magnetic head, magnetic head, pattern formation method'20077,227,738'Electrolyte for electrolytic capacitor, electrolytic capacitor and process for producing tetrafluoroaluminate salt of organic onium'20077,081,277'Magnetic disk drive having a surface coating on a magnetic disk'20067,079,378'Electrolytic solution for electrolytic capacitor and electrolytic capacitor using the same'20066,914,768'Electrical double-layer capacitor'20056,566,615'Interlocking type multi-push-switch device'20036,559,398'Rocker-type power-supply switch device'20036,271,891'Video signal processing circuit providing optimum signal level for inverse gamma correction'20016,215,080'Switch device with AC inlet and AC switch'20016,201,197'Switch device with AC inlet'20015,866,088'Process for preparing anhydrous magnesium halide solution and process for preparing solid titanium catalyst component for olefin polymerization'19995,856,513'Process for the preparation of N-alkyl-N\'-methylimidazolinium salt of organic acid'19995,587,871'Electrolyte solution for electrolytic capacitor and electrolytic capacitor using the same'19965,301,087'Electrolyte for electrolytic capacitor and electrolytic capacitor using the same'19945,155,000'Toner composition containing TiO.sub.2 particles'19925,110,703'Carrier for developer'19925,059,504'Carrier for developer'19914,965,160'Electrophotographic developer carrier particles coated with binder resin'19904,954,409'Developer for electrophotography'19904,933,506'Process for the production of dihydric phenols'19904,929,528'Coated carrier for developer'19904,914,528'Detection of a synchronizing signal in a magnetic recording/reproducing apparatus'19904,912,004'Carrier for developer'19904,902,597'Carrier for electrophotographic developer'19904,871,639'Carrier for electrophotographic developer'19894,868,083'Developer carrier and process for producing the same'19894,861,694'Process for producing carriers for developer'19894,859,558'Composition with fatty acid bisamide powder developer'19894,791,041'Magnetic carrier particles for electrophotographic developer'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–1992Patents assigned to FUJI XEROX CO LTD (13)· patent assignee history
1989–1992Based in Kanagawa, JP· patent location history
1996–2011Patents assigned to MITSUBISHI CHEM CORP (16)· patent assignee history
1999–2010Based in Ibaraki, JP· patent location history
2001–2003Based in Miyagi, JP· patent location history
2006–2017Patents assigned to FUJITSU LTD (12)· patent assignee history
2006–2017Based in Kawasaki, JP· patent location history
2007–2011Based in Mie, JP· patent location history
2008–2011Patents assigned to NIPPON CHEMICON (4)· patent assignee history
2013–2015Patents assigned to OZAKI SHIROU (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI CHEM CORP161996–2011
FUJI XEROX CO LTD131988–1992
FUJITSU LTD122006–2017
NIPPON CHEMICON42008–2011
OZAKI SHIROU42013–2015
Locations
LocationPatentsSpan
Kanagawa, JP131989–1992
Kawasaki, JP92006–2017
Ibaraki, JP71999–2010
Mie, JP62007–2011
Miyagi, JP42001–2003