Inventor

Rikio Inoue

Inventor
Kanagawa, JP

Overview

25→
Patents
1993–2020
Patent span
Physics
Primary field (CPC G)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Cprimary
G03CPhotosensitive materials for photographic purposes25%
G02BOptical elements, systems or apparatus15%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein11%
C09KMaterials for miscellaneous applications, not provided for elsewhere9%
Y10TTechnical subjects covered by former us classification9%
C08LCompositions of macromolecular compounds4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
B02CCrushing, pulverising, or disintegrating in general2%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%
C08BPolysaccharides2%
PatentTitleYear
10,758,917Coal pulverizing apparatus, control device and control method for same, and coal-fired power plant202010,459,290Optical film, polarizing plate, and image display device20199,904,099'Liquid crystal display device'20189,885,910'Twisted alignment mode liquid crystal display device'20189,709,261'Condensate flow rate control device and condensate flow rate control method for power plant'20179,128,321'Polarizing plate and TN-type liquid crystal display including the same'20159,013,656'Polarizing plate and liquid crystal display'20158,962,109'Liquid crystal display'20158,953,000'Liquid crystal display and method of driving liquid crystal display'20158,623,475'Antireflective film, polarizing plate and image display device'20148,137,767'Antireflective film, polarizing plate and image display device'20127,846,511'Transparent film and method for manufacturing the same, polarized plate and image display device'20107,439,011'Photothermographic material'20087,419,774'Photothermographic material and method for processing the same'20087,226,728'Photothermographic material'20077,223,528'Photothermographic material and image forming method'20077,138,223'Photothermographic material'20066,749,999'Photothermographic material and image formation method utilizing the same'20046,468,730'Image recording material'20026,329,662'Radiation image forming system'20015,824,458'Developer and fixing solution for silver halide photographic material and processing method using the same'19985,700,630'Silver halide photographic material and method for processing the same'19975,674,675'Silver halide photographic material'19975,310,636'Silver halide photographic material and the development processing method'19945,190,855'Silver halide photographic material and method for processing the same'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2006Patents assigned to FUJI PHOTO FILM CO LTD (9)· patent assignee history
1993–2019Based in Kanagawa, JP· patent location history
2002–2015Based in Minami-ashigara, JP· patent location history
2007–2019Patents assigned to FUJIFILM CORP (13)· patent assignee history
2012–2017Patents assigned to INOUE RIKIO (6)· patent assignee history
2012–2014Patents assigned to MIFUNE HIROYUKI (2)· patent assignee history
2017–2020Patents assigned to MITSUBISHI HITACHI POWER SYS (2)· patent assignee history
2017–2020Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJIFILM CORP132007–2019
FUJI PHOTO FILM CO LTD91993–2006
INOUE RIKIOself62012–2017
MIFUNE HIROYUKI22012–2014
MITSUBISHI HITACHI POWER SYS22017–2020
Locations
LocationPatentsSpan
Kanagawa, JP171993–2019
Minami-ashigara, JP62002–2015
Tokyo, JP22017–2020