Inventor
Craig A. Roderick
Inventor
San Jose, CA, US
Overview
Patents· 36 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H01FMagnets20%
C23CCoating metallic material16%
H05HPlasma technique7%
H03HImpedance networks, e.g. resonant circuits6%
B01DSeparation2%
G01RMeasuring electric variables1%
H01PWaveguides1%
H05KPrinted circuits1%
PatentTitleYear
6,790,311'Plasma reactor having RF power applicator and a dual-purpose window'20046,736,931'Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor'20046,545,420'Plasma reactor using inductive RF coupling, and processes'20036,518,195'Plasma reactor using inductive RF coupling, and processes'20036,514,376'Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna'20036,488,807'Magnetic confinement in a plasma reactor having an RF bias electrode'20026,454,898'Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners'20026,444,085'Inductively coupled RF plasma reactor having an antenna adjacent a window electrode'20026,440,866'Plasma reactor with heated source of a polymer-hardening precursor material'20026,365,063'Plasma reactor having a dual mode RF power application'20026,353,206'Plasma system with a balanced source'20026,251,792'Plasma etch processes'20016,252,354'RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control'20016,218,312'Plasma reactor with heated source of a polymer-hardening precursor material'20016,165,311'Inductively coupled RF plasma reactor having an overhead solenoidal antenna'20006,074,488'Plasma chamber support having an electrically coupled collar ring'20006,074,512'Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners'20006,068,784'Process used in an RF coupled plasma reactor'20006,063,233'Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna'20006,043,607'Apparatus for exciting a plasma in a semiconductor wafer processing system using a complex RF waveform'20006,036,877'Plasma reactor with heated source of a polymer-hardening precursor material'20006,024,826'Plasma reactor with heated source of a polymer-hardening precursor material'20005,990,017'Plasma reactor with heated source of a polymer-hardening precursor material'19995,872,456'Apparatus for directly measuring component values within an RF circuit'19995,583,737'Electrostatic chuck usable in high density plasma'19965,574,410'Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits'19965,572,170'Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits'19965,556,501'Silicon scavenger in an inductively coupled RF plasma reactor'19965,539,609'Electrostatic chuck usable in high density plasma'19965,392,018'Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits'19955,350,479'Electrostatic chuck for high power plasma processing'19945,349,313'Variable RF power splitter'19945,300,460'UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers'19945,210,466'VHF/UHF reactor system'19935,187,454'Electronically tuned matching network using predictor-corrector control system'19935,065,118'Electronically tuned VHF/UHF matching network'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–2003Patents assigned to APPLIED MATERIALS INC (34)· patent assignee history
1991–2004Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 34 | 1991–2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 36 | 1991–2004 |