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Inventor

Kiwamu Tsukamoto

Inventor
Tokyo, JP

Overview

19→
Patents
1998–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps31%
C23CCoating metallic material22%
G01NInvestigating or analysing materials by determining their chemical or physical properties19%
C30BSingle-crystal growth6%
B08BCleaning in general3%
F04BPositive-displacement machines for liquids3%
F16KValves3%
H01LSemiconductor devices3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
10,446,404Electron-beam irradiated area adjustment method and adjustment system, electron-beam irradiated region correction method, and electron beam irradiation apparatus201910,157,722Inspection device20189,852,878Surface processing apparatus20179,601,302'Inspection apparatus'20179,134,261'Inspection apparatus'20159,105,444'Electro-optical inspection apparatus and method with dust or particle collection function'20158,946,629'Inspection apparatus'20158,742,344'Inspection apparatus'20148,624,182'Electro-optical inspection apparatus and method with dust or particle collection function'20148,497,476'Inspection device'20136,419,462'Positive displacement type liquid-delivery apparatus'20026,387,182'Apparatus and method for processing substrate'20026,176,929'Thin-film deposition apparatus'20016,116,267'Valving device'20006,022,413'Thin-film vapor deposition apparatus'20005,950,925'Reactant gas ejector head'19995,950,646'Vapor feed supply system'19995,935,337'Thin-film vapor deposition apparatus'19995,728,223'Reactant gas ejector head and thin-film vapor deposition apparatus'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2019Patents assigned to EBARA CORP (19)· patent assignee history
1998–2000Based in Fujisawa, JP· patent location history
2000–2001Based in Chigasaki, JP· patent location history
2002–2019Based in Tokyo, JP· patent location history
2002Based in Kanagawa, JP· patent location history
2013–2014Patents assigned to HATAKEYAMA MASAHIRO (2)· patent assignee history
2013–2014Patents assigned to HAYASHI TAKEHIDE (2)· patent assignee history
2013–2014Patents assigned to KOHAMA TATSUYA (2)· patent assignee history
2013–2014Patents assigned to MURAKAMI TAKESHI (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP191998–2019
HATAKEYAMA MASAHIRO22013–2014
HAYASHI TAKEHIDE22013–2014
KOHAMA TATSUYA22013–2014
MURAKAMI TAKESHI22013–2014
Locations
LocationPatentsSpan
Tokyo, JP112002–2019
Fujisawa, JP51998–2000
Chigasaki, JP22000–2001
Kanagawa, JP12002