Inventor
Arthur Laflamme
Inventor
Rowley, MA, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
F24FAir-conditioning14%
C23CCoating metallic material12%
C25DProcesses for the electrolytic or electrophoretic production of coatings12%
B01DSeparation10%
F28DHeat-exchange apparatus, not provided for in another subclass, in which the heat-exchange media do not come into direct contact10%
F28FDetails of heat-exchange and heat-transfer apparatus, of general application10%
H01JElectric discharge tubes or discharge lamps6%
F25BRefrigeration machines, plants or systems4%
PatentTitleYear
11,098,909Methods and systems for turbulent, corrosion resistant heat exchangers202110,760,830Desiccant air conditioning methods and systems202010,443,868Methods and systems for turbulent, corrosion resistant heat exchangers20199,835,340Methods and systems for turbulent, corrosion resistant heat exchangers20179,631,848'Desiccant air conditioning systems with conditioner and regenerator heat transfer fluid loops'20179,308,490'Methods and systems for turbulent, corrosion resistant heat exchangers'20169,101,875'Methods and systems for turbulent, corrosion resistant heat exchangers'20158,409,399'Reduced maintenance chemical oxide removal (COR) processing system'20138,303,715'High throughput thermal treatment system and method of operating'20127,964,058'Processing system and method for chemically treating a substrate'20117,743,731'Reduced contaminant gas injection system and method of using'20107,651,583'Processing system and method for treating a substrate'20107,462,243'Chemical processing system and method'20087,461,614'Method and apparatus for improved baffle plate'20087,462,564'Processing system and method for treating a substrate'20087,079,760'Processing system and method for thermally treating a substrate'20067,029,536'Processing system and method for treating a substrate'20066,951,821'Processing system and method for chemically treating a substrate'20056,695,318'Electronic device processing equipment having contact gasket between chamber parts'20046,558,506'Etching system and etching chamber'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2013Patents assigned to TOKYO ELECTRON LTD (13)· patent assignee history
2003–2021Based in Rowley, MA, US· patent location history
2012–2013Patents assigned to HAMELIN THOMAS (2)· patent assignee history
2012–2013Patents assigned to LAFLAMME JR ARTHUR H (2)· patent assignee history
2015–2016Patents assigned to 7AC TECHNOLOGIES INC (2)· patent assignee history
2017–2020Patents assigned to 7AC TECH INC (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 13 | 2003–2013 |
| 7AC TECH INC | 4 | 2017–2020 |
| 7AC TECHNOLOGIES INC | 2 | 2015–2016 |
| HAMELIN THOMAS | 2 | 2012–2013 |
| LAFLAMME JR ARTHUR Hself | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Rowley, Massachusetts, US | 20 | 2003–2021 |