Inventor
Alan E. Rosenbluth
Inventor
Yorktown Heights, NY, US
Overview
Patents· 105 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices48%
G06FElectric digital data processing13%
G02BOptical elements, systems or apparatus12%
H04NPictorial communication, e.g. television7%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
G09GArrangements or circuits for control of indicating devices using static means to present variable information3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
G21KHandling of particles or ionising radiation not otherwise provided for1%
PatentTitleYear
10,915,686Tool to provide integrated circuit masks with accurate dimensional compensation of patterns202110,872,188Tool to provide integrated circuit masks with accurate dimensional compensation of patterns202010,437,950Tool to provide integrated circuit masks with accurate dimensional compensation of patterns201910,394,984Tool to provide integrated circuit masks with accurate dimensional compensation of patterns201910,210,295Tool to provide integrated circuit masks with accurate dimensional compensation of patterns201910,120,963Figurative models calibrated to correct errors in process models20189,857,676'Method and program product for designing source and mask for lithography'20189,651,856'Source, target and mask optimization by incorporating contour based assessments and integration over process variations'20179,395,622'Synthesizing low mask error enhancement factor lithography solutions'20169,310,674'Mask that provides improved focus control using orthogonal edges'20169,250,535'Source, target and mask optimization by incorporating countour based assessments and integration over process variations'20168,959,462'Mask design method, program, and mask design system'20158,954,898'Source-mask optimization for a lithography process'20158,910,089'Printing process calibration and correction'20148,880,382'Analyzing a patterning process using a model of yield'20148,867,024'Reflective film interface to restore transverse magnetic wave contrast in lithographic processing'20148,769,445'Method for determining mask operation activities'20148,719,735'Optimizing lithographic mask for manufacturability in efficient manner'20148,682,634'Analyzing a patterning process using a model of yield'20148,605,254'Constrained optimization of lithographic source intensities under contingent requirements'20138,537,444'System and method for projection lithography with immersed image-aligned diffractive element'20138,539,390'Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge'20138,495,528'Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process'20138,453,076'Wavefront engineering of mask data for semiconductor device design'20138,448,098'Fracturing continuous photolithography masks'20138,372,565'Method for optimizing source and mask to control line width roughness and image log slope'20138,351,037'Method to match exposure tools using a programmable illuminator'20138,271,910'EMF correction model calibration using asymmetry factor data obtained from aerial images or a patterned layer'20128,266,554'Dynamic provisional decomposition of lithographic patterns having different interaction ranges'20128,266,556'Fracturing continuous photolithography masks'20128,238,644'Fast method to model photoresist images using focus blur and resist blur'20128,234,603'Method for fast estimation of lithographic binding patterns in an integrated circuit layout'20128,161,422'Fast and accurate method to simulate intermediate range flare effects'20128,125,618'Reflective film interface to restore transverse magnetic wave contrast in lithographic processing'20128,108,802'Method for forming arbitrary lithographic wavefronts using standard mask technology'20128,078,995'Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations'20118,073,288'Rendering a mask using coarse mask representation'20118,059,885'Calculating image intensity of mask by decomposing Manhattan polygon based on parallel edge'20118,059,884'Method and system for obtaining bounds on process parameters for OPC-verification'20118,056,026'Determining manufacturability of lithographic mask by selecting target edge pairs used in determining a manufacturing penalty of the lithographic mask'20118,056,023'Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic mask'20118,028,254'Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scale'20117,975,244'Methodology and system for determining numerical errors in pixel-based imaging simulation in designing lithographic masks'20117,969,554'Method, computer program, apparatus and system providing printing for an illumination mask for three-dimensional images'20117,944,545'High contrast lithographic masks'20117,844,938'Data correcting hierarchical integrated circuit layout accommodating compensate for long range critical dimension variation'20107,840,057'Simultaneous computation of multiple points on one or multiple cut lines'20107,774,737'Performance in model-based OPC engine utilizing efficient polygon pinning method'20107,761,839'Performance in model-based OPC engine utilizing efficient polygon pinning method'20107,736,841'Reflective film interface to restore transverse magnetic wave contrast in lithographic processing'20107,712,071'Printing a mask with maximum possible process window through adjustment of the source distribution'20107,685,559'Step-walk relaxation method for global optimization of masks'20107,587,702'Step-walk relaxation method for global optimization of masks'20097,512,927'Printability verification by progressive modeling accuracy'20097,470,504'Reflective film interface to restore transverse magnetic wave contrast in lithographic processing'20087,440,083'Printing a mask with maximum possible process window through adjustment of the source distribution'20087,434,196'Renesting interaction map into design for efficient long range calculations'20087,366,342'Simultaneous computation of multiple points on one or multiple cut lines'20087,363,611'Printing a mask with maximum possible process window through adjustment of the source distribution'20087,343,271'Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare'20087,343,582'Optical proximity correction using progressively smoothed mask shapes'20087,287,239'Performance in model-based OPC engine utilizing efficient polygon pinning method'20077,269,817'Lithographic process window optimization under complex constraints on edge placement'20077,131,104'Fast and accurate optical proximity correction engine for incorporating long range flare effects'20067,127,699'Method for optimizing a number of kernels used in a sum of coherent sources for optical proximity correction in an optical microlithography process'20067,097,884'Stability of ion beam generated alignment layers by surface modification'20067,079,223'Fast model-based optical proximity correction'20067,057,709'Printing a mask with maximum possible process window through adjustment of the source distribution'20067,057,686'Liquid crystal structure with improved black state, and projector using same'20067,055,126'Renesting interaction map into design for efficient long range calculations'20067,010,776'Extending the range of lithographic simulation integrals'20066,869,739'Integrated lithographic print and detection model for optical CD'20056,798,475'Reflective light valve'20046,665,033'Method for forming alignment layer by ion beam surface modification'20036,650,383'Band-shifted liquid crystal structure for projection of images without spectral distortion'20036,636,276'Projection display system with at least two reflective light valves'20036,563,566'System and method for printing semiconductor patterns using an optimized illumination and reticle'20036,512,502'Lightvalve projection system in which red, green, and blue image subpixels are projected from two lightvalves and recombined using total reflection prisms'20036,377,233'Micromechanical display and fabrication method'20026,341,038'Apparatus for polarization conversion'20026,332,693'Apparatus and method for intensifying illumination brightness by time-superposing multiple pulsed light sources'20016,323,834'Micromechanical displays and fabrication method'20016,208,327'Camouflage of imaged post spacers and compensation of pixels that depart from nominal operating conditions by luminance diffusion'20016,193,393'Apparatus and method for intensifying illumination brightness by time-superposing multiple pulsed light sources'20016,082,861'Optical system and method for high contrast projection display'20006,080,528'Camouflage of imaged post spacers and compensation of pixels that depart from nominal operating conditions by luminance diffusion by mechanical means'20006,064,523'Apparatus for polarization conversion'20006,052,231'Beam dividing elements permitting projection of an image with high contrast'20005,921,650'High efficiency field-sequential color projector using two SLMs'19995,786,873'Efficient optical system for a high resolution projection display employing reflection light valves'19985,786,934'Efficient optical system for a high resolution projection display employing reflection light valves'19985,777,789'Efficient optical system for a high resolution projection display employing reflection light valves'19985,729,383'Oblique viewing microscope system'19985,715,081'Oblique viewing microscope system'19985,680,588'Method and system for optimizing illumination in an optical photolithography projection imaging system'19975,673,144'Oblique viewing microscope system'19975,621,486'Efficient optical system for a high resolution projection display employing reflection light valves'19975,517,340'High performance projection display with two light valves'19965,452,090'CCD based confocal filtering for improved accuracy in x-ray proximity alignment'19955,298,351'Ablation mask and use thereof'19945,274,420'Beamsplitter type lens elements with pupil-plane stops for lithographic systems'19935,159,172'Optical projection system'19924,902,899'Lithographic process having improved image quality'19904,896,952'Thin film beamsplitter optical element for use in an image-forming lens system'19904,317,043'Normal incidence x-ray reflectors and resonant cavities for supporting laser action using the same'1982Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1982Based in Rochester, NY, US· patent location history
1990–2021Patents assigned to IBM (102)· patent assignee history
1990–2021Based in Yorktown Heights, NY, US· patent location history
2011–2014Patents assigned to ROSENBLUTH ALAN E (24)· patent assignee history
2011–2014Patents assigned to TIAN KEHAN (15)· patent assignee history
2011–2014Patents assigned to LAI KAFAI (11)· patent assignee history
2012–2014Patents assigned to BAGHERI SAEED (9)· patent assignee history
2012–2013Based in Watson, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 102 | 1990–2021 |
| ROSENBLUTH ALAN Eself | 24 | 2011–2014 |
| TIAN KEHAN | 15 | 2011–2014 |
| LAI KAFAI | 11 | 2011–2014 |
| BAGHERI SAEED | 9 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yorktown Heights, New York, US | 102 | 1990–2021 |
| Watson, New York, US | 2 | 2012–2013 |
| Rochester, New York, US | 1 | 1982 |