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Inventor

Kei Shioya

Inventor
Tokyo, JP

Overview

2→
Patents
2015–2020
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary
B01DSeparation17%
B01FMixing, e.g. dissolving, emulsifying or dispersing17%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry17%
B01LChemical or physical laboratory apparatus for general use17%
B08BCleaning in general17%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
PatentTitleYear
10,603,667Automatic analysis device and cleaning mechanism in automatic analysis device20209,084,961'Gas-liquid contacting plate, gas-liquid contacting laminated block body, gas-liquid contacting laminated structure and gas purification device'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015Patents assigned to FUJIKAWA KEIJI (1)· patent assignee history
2015Patents assigned to HIRATA TAKUYA (1)· patent assignee history
2015Patents assigned to ICHIKAWA SHUNJI (1)· patent assignee history
2015Patents assigned to KOJIMA AKIHIRO (1)· patent assignee history
2015Based in Kanagawa, JP· patent location history
2020Patents assigned to HITACHI HIGH TECH CORP (1)· patent assignee history
2020Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJIKAWA KEIJI12015
HIRATA TAKUYA12015
HITACHI HIGH TECH CORP12020
ICHIKAWA SHUNJI12015
KOJIMA AKIHIRO12015
Locations
LocationPatentsSpan
Tokyo, JP12020
Kanagawa, JP12015