Inventor
Isao Ota
Inventor
Funabashi, JP
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Kprimary
C09KMaterials for miscellaneous applications, not provided for elsewhere17%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds14%
B82YSpecific uses or applications of nanostructures11%
C01FCompounds of the metals beryllium, magnesium, aluminium, calcium, strontium, barium, radium, thorium, or of the rare-earth metals10%
C09GPolishing compositions9%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein6%
C01GCompounds containing metals not covered by subclasses c01d or c01f4%
H04NPictorial communication, e.g. television3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry2%
PatentTitleYear
8,323,368'Production method of polishing composition'20127,887,714'Cerium oxide sol and abrasive'20117,678,703'Production method of polishing composition'20107,578,862'Abrasive compound for glass hard disk platter'20097,484,679'Method of milling cerium compound by means of ball mill'20097,431,758'Cerium oxide particles and production method therefor'20087,423,380'Metal halide lamp that has desired color characteristic and is prevented from non-lighting due to leakage of arc tube attributable to crack occurring at thin tube, and lighting apparatus adopting the metal halide lamp'20087,230,389'Metal halide lamp having function for suppressing abnormal discharge'20076,887,289'Cerium oxide sol and abrasive'20056,719,819'Polishing composition'20046,706,082'Crystalline ceric oxide sol and process for producing the same'20046,440,187'Alumina powder, process for producing the same and polishing composition'20026,398,827'Polishing composition'20026,372,003'Polishing abrasive of crystalline ceric oxide particles having surfaces modified with hydroxyl groups'20026,311,545'Anhydrous zinc antimonate semiconductor gas sensor and method for producing the same'20016,149,888'Method of producing anhydrous zinc antimonate'20006,007,592'Polishing composition for aluminum disk and polishing process therewith'19995,962,343'Process for producing crystalline ceric oxide particles and abrasive'19995,543,126'Process for preparing crystalline ceric oxide'19965,433,878'Method for producing fine particles of barium ferrite'19955,166,817'Liquid crystal display with compensation means of multiaxially elongated high polymer films'19925,042,917'Liquid crystal matrix display unit'19915,011,269'Method of driving a ferroelectric liquid crystal matrix panel'19915,010,327'Method of driving a liquid crystal matrix panel'19914,775,549'Method of producing a substrate structure for a large size display panel and an apparatus for producing the substrate structure'19884,704,002'Dot matrix display panel with a thin film transistor and method of manufacturing same'19874,496,981'Video camera with a monitor'19854,332,075'Method of producing thin film transistor array'1982Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1982–2008Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (10)· patent assignee history
1982–1992Based in Osaka, JP· patent location history
1995–2012Patents assigned to NISSAN CHEMICAL IND LTD (18)· patent assignee history
1995–2004Based in Funabashi, JP· patent location history
2004–2011Based in Nishikamo-gun, JP· patent location history
2009Based in Sodegaura, JP· patent location history
2010–2012Based in Toyama, JP· patent location history
2012Patents assigned to OTA ISAO (1)· patent assignee history
2012Patents assigned to TAKAKUMA NORIYUKI (1)· patent assignee history
2012Patents assigned to TANIMOTO KENJI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NISSAN CHEMICAL IND LTD | 18 | 1995–2012 |
| MATSUSHITA ELECTRIC INDUSTRIAL CO LTD | 10 | 1982–2008 |
| OTA ISAOself | 1 | 2012 |
| TAKAKUMA NORIYUKI | 1 | 2012 |
| TANIMOTO KENJI | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Funabashi, JP | 9 | 1995–2004 |
| Osaka, JP | 8 | 1982–1992 |
| Nishikamo-gun, JP | 5 | 2004–2011 |
| Toyama, JP | 2 | 2010–2012 |
| Sodegaura, JP | 1 | 2009 |