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Inventor

Guenther Kaempf

Inventor
Oestrich-Winkel, DE

Overview

2→
Patents
1989–1992
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
C09DCoating compositions, e.g. paints, varnishes or lacquers20%
H01BCables20%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
PatentTitleYear
5,137,799'Electrically conductive resist material, a process for its preparation and its use'19924,842,982'Radiation-sensitive recording material having radiation-sensitive recording layer and discontinuous radiation-sensitive covering layer of the same composition'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–1992Patents assigned to HOECHST AG (2)· patent assignee history
1989–1992Based in Oestrich-Winkel, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HOECHST AG21989–1992
Locations
LocationPatentsSpan
Oestrich-Winkel, DE21989–1992