Inventor
Fumio Aramaki
Inventor
Tokyo, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps52%
G21KHandling of particles or ionising radiation not otherwise provided for15%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
G01QScanning-probe techniques or apparatus7%
G06TImage data processing or generation, in general7%
B82YSpecific uses or applications of nanostructures4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
PatentTitleYear
10,276,343Method for acquiring image and ion beam apparatus201910,014,157Method for acquiring image and ion beam apparatus20189,793,085'Focused ion beam apparatus'20179,793,092'Charged particle beam apparatus and processing method'20179,773,634'Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus'20179,583,299'Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus'20179,418,817'Focused ion beam apparatus and control method thereof'20169,378,858'Repair apparatus'20169,336,979'Focused ion beam apparatus with precious metal emitter surface'20168,999,178'Method for fabricating emitter'20158,963,100'Nitrogen ions from a gas field ion source held at a pressure of 1.0 x 10^(-6) pa to 1.0 x 10^(-2) pa'20158,890,093'Charged particle beam apparatus and method for forming observation image'20148,764,994'Method for fabricating emitter'20148,460,842'Defect repair apparatus and method for EUV mask using a hydrogen ion beam'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2015Patents assigned to ARAMAKI FUMIO (2)· patent assignee history
2013–2015Patents assigned to YASAKA ANTO (2)· patent assignee history
2013–2015Based in Chiba, JP· patent location history
2014–2019Patents assigned to HITACHI HIGH TECH SCIENCE CORP (8)· patent assignee history
2014–2019Based in Tokyo, JP· patent location history
2015Patents assigned to KOZAKAI TOMOKAZU (1)· patent assignee history
2016–2017Patents assigned to HITACHI HIGH-TECH SCIENCE CORP (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI HIGH TECH SCIENCE CORP | 8 | 2014–2019 |
| HITACHI HIGH-TECH SCIENCE CORP | 5 | 2016–2017 |
| ARAMAKI FUMIOself | 2 | 2013–2015 |
| YASAKA ANTO | 2 | 2013–2015 |
| KOZAKAI TOMOKAZU | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 12 | 2014–2019 |
| Chiba, JP | 2 | 2013–2015 |