Inventor
YUKIO INAZUKI
Inventor
JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%
C23CCoating metallic material18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H01LSemiconductor devices14%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
G21KHandling of particles or ionising radiation not otherwise provided for5%
PatentTitleYear
12,265,321Reflective mask blank, and method for manufacturing reflective mask202512,050,396Reflective mask blank, method of manufacturing thereof, and reflective mask202411,860,529Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank202411,835,851Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank202311,789,357Method of manufacturing reflective mask blank, and reflective mask blank202311,624,712Substrate defect inspection method and substrate defect inspection apparatus202311,415,874Method of manufacturing reflective mask blank, reflective mask blank, and method of manufacturing reflective mask202211,327,393Photomask blank and method for preparing photomask202211,143,949Photomask blank, method of manufacturing photomask, and photomask2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to SHINETSU CHEMICAL CO (9)· patent assignee history
2021–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 9 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 9 | 2021–2025 |