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Inventor

Souichi Asakawa

Inventor
Akishima, JP

Overview

1→
Patents
2011
Patent span
Performing operations
Primary field (CPC B)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
8,029,333'Device for polishing peripheral edge of semiconductor wafer'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011Patents assigned to EBARA CORP (1)· patent assignee history
2011Patents assigned to NIPPON MICRO COATING KK (1)· patent assignee history
2011Based in Akishima, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP12011
NIPPON MICRO COATING KK12011
Locations
LocationPatentsSpan
Akishima, JP12011