Inventor
Hirofumi Sasaki
Inventor
Tokyo, JP
Overview
Patents· 35 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices12%
G06FElectric digital data processing9%
H05KPrinted circuits8%
Y10TTechnical subjects covered by former us classification7%
H10NElectric solid-state devices not otherwise provided for5%
B01FMixing, e.g. dissolving, emulsifying or dispersing3%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
B22DCasting of metals3%
C01FCompounds of the metals beryllium, magnesium, aluminium, calcium, strontium, barium, radium, thorium, or of the rare-earth metals3%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds3%
PatentTitleYear
11,018,749OAM multiplexing communication system and inter-mode interference compensation method202110,873,376OAM multiplexing communication system, OAM multiplexing transmission device, OAM multiplexing receiving device, and OAM multiplexing communication method202010,795,689Reconfigurable logical circuit202010,697,189Connector for temporary scaffolding202010,679,886Workpiece treating method, semiconductor device, process for manufacturing the same, and temporary fixing composition for shear peeling202010,234,472Automatic analysis device201910,073,492Electronic device20189,971,385Lock mechanism, and electronic device equipped with lock mechanism20189,655,425'Strap and electronic device'20179,340,952'Construction machine'20169,326,392'Display device'20169,253,903'Electric apparatus with support leg'20169,226,419'Electronic device'20159,212,464'Construction machine'20159,215,821'Electronic device'20159,176,156'Automatic analyzer including pressure sensor for washing solution'20158,455,173'Photosensitive insulating resin composition, cured product of the composition, and method of producing insulating film'20138,309,295'Photosensitive insulating resin composition, hardening product thereof, and circuit board equipped therewith'20128,293,129'Method for manufacturing piezoelectric element'20128,189,296'Thin-film piezoelectric device, production method thereof, head gimbals assembly using the thin-film piezoelectric device, and hard disk using the head gimbals assembly'20128,183,749'Electronic device and method of making same'20127,814,960'Mold oscillating apparatus'20107,811,546'Aluminum hydroxide aggregated particles, process for producing the same, vessel used therefor, and process for producing aluminum hydroxide powder'20107,714,033'Photosensitive insulating resin composition, cured product thereof and electronic component comprising the same'20107,704,465'Aluminum hydroxide aggregated particles producing vessel'20107,636,994'Method of making a piezoelectric device'20097,332,254'Positive photosensitive insulating resin composition, cured product thereof, and electronic component'20086,994,944'Radiation sensitive resin composition, cathode separator and EL display device'20066,984,476'Radiation-sensitive resin composition, forming process for forming patterned insulation film, active matrix board and flat-panel display device equipped with the same, and process for producing flat-panel display device'20066,852,476'Radiation sensitive resin composition, rib, rib forming method and display element'20056,797,450'Radiation-sensitive composition, insulating film and organic EL display element'20046,797,453'Radiation sensitive composition for forming an insulating film, insulating film and display device'20046,693,334'Semiconductor integrated circuit device'20044,767,320'Automatically flow controlled continuous heat treating furnace'19884,603,729'Piping assembly for use in roll section of continuous casting line'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–2018Based in Osaka, JP· patent location history
2004–2020Patents assigned to JSR CORP (10)· patent assignee history
2004–2020Based in Tokyo, JP· patent location history
2009–2012Patents assigned to TDK CORP (4)· patent assignee history
2010Based in Niihama, JP· patent location history
2012–2015Patents assigned to SASAKI HIROFUMI (6)· patent assignee history
2015–2018Patents assigned to PANASONIC IP MAN CO LTD (7)· patent assignee history
2015–2016Patents assigned to PANASONIC CORP (4)· patent assignee history
2015–2016Based in Hyogo, JP· patent location history
2015–2016Based in Hiroshima, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JSR CORP | 10 | 2004–2020 |
| PANASONIC IP MAN CO LTD | 7 | 2015–2018 |
| SASAKI HIROFUMIself | 6 | 2012–2015 |
| PANASONIC CORP | 4 | 2015–2016 |
| TDK CORP | 4 | 2009–2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 15 | 2004–2020 |
| Osaka, JP | 4 | 1988–2018 |
| Hyogo, JP | 4 | 2015–2016 |
| Hiroshima, JP | 2 | 2015–2016 |
| Niihama, JP | 2 | 2010 |